Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL868046 | 0.76 | KDM4E (0.33) | KDM4ECYP3A4CA2 | |
| SCHEMBL92892 | 0.70 | — | — | |
| SCHEMBL11109760 | 0.70 | — | — | |
| SCHEMBL11374297 | 0.70 | — | — | |
| SCHEMBL29896471 | 0.68 | — | — | |
| SCHEMBL17322566 | 0.67 | — | — | |
| SCHEMBL1149141 | 0.67 | KDM4E (0.42) | KDM4ECYP3A4CA1ALDH1A1USP2 | |
| SCHEMBL245684 | 0.67 | — | — | |
| SCHEMBL6910515 | 0.67 | — | — | |
| SCHEMBL30896661 | 0.67 | KDM4E (0.42) | KDM4ECYP3A4CA1ALDH1A1USP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115151591-B | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2024-03-01 | — | — | CN | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305394-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| CN-111699204-B | Radical polymerization initiator, composition containing the same, cured product thereof, method for producing the same, and compound | 株式会社ADEKA | 2023-07-21 | — | — | CN | disclosed |
| WO-2023112893-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2023-06-22 | — | — | WO | disclosed |
| US-20230152697-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-05-18 | — | — | US | disclosed |
| US-20230152697-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-05-18 | — | — | US | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| US-20040101787-A1 | Fine pattern forming method | DAIKIN INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1413927-A1 | METHOD FOR FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-1376230-A1 | FINE PATTERN FORMING METHOD | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6054254-A | COATING WITH PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-25 | — | — | US | disclosed |
| EP-0707094-B1 | Process for preparing perfluoroalkanesulfonyl fluorides | MINNESOTA MINING & MFG (US) | 1998-07-22 | — | — | EP | disclosed |
| EP-0707094-A1 | Process for preparing perfluoroalkanesulfonyl fluorides | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-04-17 | — | — | EP | disclosed |
| US-5486271-A | Process for preparing perfluoroalkanesulfonyl fluorides | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-01-23 | — | — | US | disclosed |
| US-5372914-A | Pattern forming method | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-12-13 | — | — | US | disclosed |
| US-5348838-A | Photoresist | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-09-20 | — | — | US | disclosed |