Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.31 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | PDE6A | P16499 | 1/20 | 0.31 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.31 |
| ▸ | MC4R | P32245 | 1/20 | 0.31 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | MC3R | P41968 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8496529 | 0.91 | TSHR (0.45) | TSHRCYP2C19ALDH1A1LMNAKMT2A | |
| Hydrochloric Acid SCHEMBL9172317 | 0.90 | TSHR (0.44) | TSHRCYP2C19ALDH1A1LMNAKMT2A | |
| Bromide SCHEMBL9169395 | 0.90 | TSHR (0.44) | TSHRCYP2C19ALDH1A1LMNAKMT2A | |
| Hydrochloric Acid SCHEMBL11410885 | 0.89 | TSHR (0.43) | TSHRCYP2C19ALDH1A1LMNACYP1A2 | |
| SCHEMBL8887364 | 0.87 | TSHR (0.41) | TSHRCYP2C19ALDH1A1LMNAKMT2A | |
| SCHEMBL11110548 | 0.86 | TSHR (0.39) | TSHRALDH1A1LMNAADRA2CADRA1A | |
| SCHEMBL8887363 | 0.85 | TSHR (0.39) | TSHRCYP2C19ALDH1A1LMNAKMT2A | |
| Sulfuric Acid SCHEMBL9170625 | 0.85 | TSHR (0.39) | TSHRALDH1A1CA2LMNAKMT2A | |
| SCHEMBL8987977 | 0.76 | — | — | |
| SCHEMBL3376101 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5407777-A | Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(phenidone) as an anti-oxidant | FUJI PHOTO FILM CO., LTD. (JP) | 1995-04-18 | — | — | US | claimed |
| US-4486527-A | HEAT-FUSIBLE COLOR ASSISTANT | RICOH COMPANY, LTD. (JP) | 1984-12-04 | — | — | US | claimed |
| US-10415011-B2 | Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition | JSR CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| EP-3040411-B1 | ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE | JSR CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| EP-3040411-A1 | ADHEREND RECOVERY METHOD, ADHEREND RECOVERY DEVICE, GAS GENERATION MEMBRANE, AND RESIN COMPOSITION | JSR Corporation (JP) | 2016-07-06 | — | — | EP | disclosed |
| US-20160168532-A1 | ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATING FILM AND RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| US-6077642-A | SUBSTRATE WITH HEAT SENSITIVE RECORDING LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| EP-0803377-B1 | Recording material | FUJI PHOTO FILM CO LTD (JP) | 1999-11-24 | — | — | EP | disclosed |
| US-5977019-A | MULTILAYER; HEAT SENSITIVE RECORDING LAYERS ON SUPPORT; RESIN LAYER ON PAPER | FUJI PHOTO FILM CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5945247-A | Heat development duplicating material comprising ascorbic acid | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-31 | — | — | US | disclosed |
| US-5935757-A | HIGH COLOR DEVELOPING SENSITIVITY AND EXCELLENT STORABILITY. USING AN ESTER- OR AMIDE CONTAINING SULFOAMIDOBENZENE IN A LAYER CONTAINING A DIAZONIUM SALT AND A REACTIVE COUPLER | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-10 | — | — | US | disclosed |
| US-4598035-A | LEUCO AND DISAZO DYES | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-01 | — | — | US | disclosed |
| US-4529681-A | Microcapsules containing vinyl compound, photoinitiator and color forming compound | FUJI PHOTO FILM CO., LTD. (JP) | 1985-07-16 | — | — | US | disclosed |
| US-4497887-A | Thermal development type diazo copying material with hydrophobic resin encapsulated coupler particle | Ricoh Compay, Ltd. (JP) | 1985-02-05 | — | — | US | disclosed |
| US-4486527-A | HEAT-FUSIBLE COLOR ASSISTANT | RICOH COMPANY, LTD. (JP) | 1984-12-04 | — | — | US | disclosed |
| EP-0123224-A2 | Heat sensitive recording materials | FUJI PHOTO FILM CO., LTD. (JP) | 1984-10-31 | — | — | EP | disclosed |
| US-4467024-A | Process for the production of thermo-developable type diazo copying material | RICOH CO., LTD. (JP) | 1984-08-21 | — | — | US | disclosed |
| EP-0109838-A2 | Light and heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1984-05-30 | — | — | EP | disclosed |
| US-4416967-A | SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, | RICOH CO., LTD. (JP) | 1983-11-22 | — | — | US | disclosed |
| US-4400456-A | FATTY ACID AMIDE COLOR ASSIST, HIGH DENSITY IMAGES | RICOH CO., LTD. (JP) | 1983-08-23 | — | — | US | disclosed |