Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL8003832

CC(Cl)(c1ccccc1)c1ccccc1.S

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.55
MAPK1 P28482 1/20 0.48
ALDH1A1 P00352 3/20 0.44
CYP1A2 P05177 1/20 0.44
TAAR1 Q96RJ0 1/20 0.44
ALOX15 P16050 1/20 0.44
ESR1 P03372 2/20 0.42
ESR2 Q92731 2/20 0.42
CYP3A4 P08684 1/20 0.42
KCNN4 O15554 3/20 0.42
MAPT P10636 1/20 0.41
KMT2A Q03164 1/20 0.41
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39
CYP2B6 P20813 1/20 0.38
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2743453 0.97 TSHR (0.58) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL27457970 0.94 TSHR (0.55) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL9727852 0.94 TSHR (0.55) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL16933918 0.85 TSHR (0.50) TSHRMAPK1ALDH1A1CYP1A2ESR1
SCHEMBL2348159 0.80 TSHR (0.52) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL7927425 0.80 TSHR (0.52) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL686644 0.79 TSHR (0.58) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL42357 0.79 TSHR (0.58) TSHRMAPK1ALDH1A1CYP1A2TAAR1
SCHEMBL96177 0.78 MAPK1 (0.55) TSHRMAPK1ALDH1A1TAAR1ALOX15
Hydrogen Peroxide SCHEMBL9456436 0.77 TSHR (0.55) TSHRMAPK1ALDH1A1CYP1A2TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122085598-A Composition, patterning method, formed pattern, semiconductor device and application thereof 2026-05-26 CN disclosed
CN-122085599-A Composition, patterning method, formed pattern, semiconductor device and application thereof 2026-05-26 CN disclosed
CN-118605082-A Small molecule composition, photoresist composition and method for forming pattern on substrate 连云港邃铸科技有限公司 2024-09-06 CN disclosed
CN-118466114-A Composition, preparation method and application 连云港邃铸科技有限公司 2024-08-09 CN disclosed
CN-113253569-B Small molecule composition, photoresist composition and method for forming pattern on substrate 上海邃铸科技有限公司 2023-10-10 CN disclosed
CN-111788236-B Photoactive polymer brush materials and EUV patterning using the same 三星电子株式会社 2023-07-04 CN disclosed
US-6042989-A Radiation sensitive compositions of terpolymers containing organosilicon side chains OLIN MICROELECTRONIC CHEMICALS, INC. (US) 2000-03-28 US disclosed
US-6028154-A Terpolymers containing organosilicon side chains OLIN MICROELECTRONIC CHEMICALS, INC. (US) 2000-02-22 US disclosed
EP-0758102-B1 Terpolymers containing organosilicon side chains and their use for the production of relief structures ARCH SPEC CHEM INC (US) 1999-12-08 EP disclosed
US-5886119-A Terpolymers containing organosilicon side chains OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-03-23 US disclosed
EP-0758102-A1 Terpolymers containing organosilicon side chains and their use for the production of relief structures OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1997-02-12 EP disclosed