SCHEMBL801634

SCHEMBL801634

O=C(CCCCC(=O)OC/C=C/CO)OC/C=C/CO

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
DGKA P23743 2/20 0.39
ALDH1A1 P00352 1/20 0.37
CYP3A4 P08684 1/20 0.37
ALOX15 P16050 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
PAM P19021 2/20 0.35
KDM4E B2RXH2 1/20 0.35
DUSP3 P51452 1/20 0.35
NR1I2 O75469 1/20 0.35
PGR P06401 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
PTGS2 P35354 1/20 0.35
PDE4D Q08499 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
LMNA P02545 1/20 0.35
MGLL Q99685 1/20 0.35
PRKCE Q02156 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13863187 1.00 TSHR (0.46) TSHRDGKAALDH1A1CYP3A4ALOX15
SCHEMBL12717162 1.00 TSHR (0.46) TSHRDGKAALDH1A1CYP3A4ALOX15
SCHEMBL10525859 0.90 TSHR (0.44) TSHRALOX15HSD17B10TDP1PAM
SCHEMBL10525854 0.90 TSHR (0.44) TSHRALOX15HSD17B10TDP1PAM
SCHEMBL13818873 0.90 TSHR (0.61) TSHRDGKAALDH1A1CYP3A4ALOX15
SCHEMBL23576212 0.89 TSHR (0.64) TSHRDGKAALDH1A1PAMKDM4E
SCHEMBL23576214 0.89 TSHR (0.64) TSHRDGKAALDH1A1PAMKDM4E
SCHEMBL13863186 0.87 TSHR (0.38) TSHRDGKAALDH1A1CYP3A4ALOX15
SCHEMBL14998046 0.84 TSHR (0.36) TSHRDGKA
SCHEMBL29311515 0.83 DGKA (0.61) TSHRDGKACYP3A4ALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177921-B2 Manufacturing method of semiconductor device FUJIFILM CORPORATION (JP) 2015-11-03 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-20140318697-A1 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2014-10-30 US disclosed
US-20140322893-A1 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2014-10-30 US disclosed
US-8802355-B2 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORPORATION (JP) 2014-08-12 US disclosed
US-8766388-B2 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition FUJIFILM CORPORATION (JP) 2014-07-01 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8735483-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8728712-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2014-05-20 US disclosed
US-8557948-B2 Photosensitive composition, photosensitive film, photosensitive laminate, method of forming a permanent pattern, and printed board FUJIFILM CORPORATION (JP) 2013-10-15 US disclosed
US-20130143164-A1 POLYMERIZABLE COMPOSITION FUJIFILM CORPORATION (JP) 2013-06-06 US disclosed
US-20130072615-A1 POLYMERIZABLE COMPOSITION FUJIFILM CORPORATION (JP) 2013-03-21 US disclosed
US-8303860-B2 Colored curable composition, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2012-11-06 US disclosed
US-20120068292-A1 POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-03-22 US disclosed
US-20120048594-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, PHOTOSENSITIVE LAMINATE, METHOD OF FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2012-03-01 US disclosed
US-20110104596-A1 POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-05-05 US disclosed
US-20110076621-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF FUJIFILM CORPORATION (JP) 2011-03-31 US disclosed
US-20110017962-A1 COLORED CURABLE COMPOSITION, COLOR FILTER AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-01-27 US disclosed