Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.34 |
| ▸ | CA12 | O43570 | 3/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | SI | P14410 | 2/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16866392 | 0.89 | TSHR (0.46) | TSHRRECQLKMT2ATET2MEN1 | |
| SCHEMBL19821844 | 0.89 | TSHR (0.48) | TSHRRECQLKMT2ATET2MEN1 | |
| SCHEMBL11964192 | 0.86 | TSHR (0.45) | TSHRRECQLKMT2ALMNAALDH1A1 | |
| SCHEMBL2607618 | 0.85 | CYP1A2 (0.42) | TSHRLMNAALDH1A1CYP4F2CYP4A11 | |
| SCHEMBL18100050 | 0.83 | CYP4F2 (0.33) | CA12CA14ALDH1A1CYP4F2CYP4A11 | |
| SCHEMBL14727468 | 0.83 | MGAM (0.40) | TSHRRECQLTET2CA12CA14 | |
| SCHEMBL12920504 | 0.82 | TSHR (0.50) | TSHRRECQLKMT2ATET2MEN1 | |
| SCHEMBL14727465 | 0.81 | RECQL (0.37) | TSHRRECQLTET2LMNAKDM4E | |
| SCHEMBL824523 | 0.81 | CYP4F2 (0.41) | TSHRALDH1A1CYP4F2CYP4A11GAA | |
| SCHEMBL17860820 | 0.80 | DGKA (0.47) | TSHRRECQLLMNAALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11773266-B2 | Polymer, molded body, foam, resin composition, and production method for polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129965-A1 | HYDROPHILIC AND OLEOPHOBIC POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20180030175-A1 | POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-9540468-B2 | Resist copolymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2017-01-10 | — | — | US | disclosed |
| US-9389507-B2 | Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| US-20140371412-A1 | RESIST COPOLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2014-12-18 | — | — | US | disclosed |
| US-20140255846-A1 | POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8766388-B2 | Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition | FUJIFILM CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8759741-B2 | Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element | FUJIFILM CORPORATION (JP) | 2014-06-24 | — | — | US | disclosed |
| US-20120199727-A1 | TITANIUM BLACK DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, WAFER LEVEL LENS, LIGHT BLOCKING FILM, METHOD FOR PRODUCING THE LIGHT BLOCKING FILM, AND SOLID-STATE IMAGE PICKUP ELEMENT | FUJIFILM CORPORATION (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120082935-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120068292-A1 | POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-03-22 | — | — | US | disclosed |