SCHEMBL8018019

SCHEMBL8018019

CCN(CC)c1ccc(C=CC(=O)C=Cc2ccc(OC)cc2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 2/20 0.71
FGFR1 P11362 1/20 0.68
GSK3B P49841 2/20 0.58
BACE1 P56817 1/20 0.57
STAT3 P40763 1/20 0.56
THRB P10828 1/20 0.55
ATM Q13315 1/20 0.55
MAOB P27338 2/20 0.55
L3MBTL1 Q9Y468 2/20 0.53
MEN1 O00255 1/20 0.53
USP2 O75604 1/20 0.53
ALDH1A1 P00352 1/20 0.53
POLB P06746 1/20 0.53
MAPT P10636 1/20 0.53
MAPK1 P28482 1/20 0.53
RECQL P46063 1/20 0.53
KMT2A Q03164 1/20 0.53
TLR9 Q9NR96 1/20 0.53
TDP1 Q9NUW8 1/20 0.53
TRPM8 Q7Z2W7 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11137142 1.00 F3 (0.71) F3FGFR1GSK3BBACE1STAT3
SCHEMBL2913262 0.89 FGFR1 (0.68) F3FGFR1THRBL3MBTL1MEN1
SCHEMBL2913259 0.89 FGFR1 (0.68) F3FGFR1THRBL3MBTL1MEN1
SCHEMBL10976207 0.89 FGFR1 (0.68) F3FGFR1THRBL3MBTL1MEN1
SCHEMBL11140136 0.87 MAOB (0.73) F3MAOBL3MBTL1MEN1USP2
SCHEMBL11522608 0.87 MAOB (0.73) F3MAOBL3MBTL1MEN1USP2
SCHEMBL6231825 0.87 MAOB (0.73) F3MAOBL3MBTL1MEN1USP2
SCHEMBL11523409 0.87 MAOB (0.73) F3MAOBL3MBTL1MEN1USP2
SCHEMBL9822910 0.86 MEN1 (0.58) FGFR1MAOBMEN1ALDH1A1MAPT
SCHEMBL2744098 0.84 F3 (1.00) F3GSK3BBACE1STAT3THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4367280-A AROMATIC CARBONYL COMPOUND AND P-DIALKYLAMINO AROMATIC CARBONYL COMPOUND COMBINATION POLYMERIZATION INITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1983-01-04 US claimed
EP-0650094-B1 Photosensitive material and process for making printing plates AGFA GEVAERT AG (DE) 2000-02-02 EP disclosed
EP-0681221-B1 Light-sensitive material and process for preparation of planographic printing plates AGFA GEVAERT AG (DE) 2000-01-26 EP disclosed
EP-0703500-B1 Process for the manufacture of a planographic printing form AGFA GEVAERT AG (DE) 1999-12-29 EP disclosed
US-5922508-A CONSISTS OF A SUPPORT AND A PHOTOPOLYMERIZABLE LAYER CONTAINING A POLYMERIC BINDER, A POLYMERIZATION INITIATOR COMBINATION COMPRISING ATLEAST ONE PHOTOREDUCIBLE DYE AND ONE PHOTOINITIATOR, A FREE RADICAL POLYMERIZABLE ACRYLIC COMPOUND AGFA-GEVAERT AG (DE) 1999-07-13 US disclosed
US-5725991-A Photosensitive material and method of producing offset printing plates AGFA-GEVAERT AG (DE) 1998-03-10 US disclosed
US-5705313-A Process for the production of a lithographic printing plate through selective transfer AGFA-GEVAERT AG (DE) 1998-01-06 US disclosed
US-5688629-A Process for the production of lithographic printing plates utilizing peel development AGFA-GEVAERT AG (DE) 1997-11-18 US disclosed
EP-0703500-A1 Process for the manufacture of a planographic printing form HOECHST AKTIENGESELLSCHAFT (DE) 1996-03-27 EP disclosed
EP-0354475-B1 Photopolymerisable image registration material HOECHST AG (DE) 1995-11-15 EP disclosed
US-5066564-A Printing plates and photoresists HOECHST AKTIENGESELLSCHAFT (DE) 1991-11-19 US disclosed
US-5049479-A Printing plates, photoresists HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-17 US disclosed
US-5043249-A Photoresists, printing plates HOECHST AKTIENGESELLSCHAFT (DE) 1991-08-27 US disclosed
US-4985341-A ACRYLIC ESTER MONOMER, PRINTING PLATES, PHOTORESISTS HOECHST AKTIENGESELLSCHAFT (DE) 1991-01-15 US disclosed
US-4983498-A PHOTOREDUCIBLE DYES AS PHOTOINITIATORS HOECHST AKTIENGESELLSCHAFT (DE) 1991-01-08 US disclosed
EP-0359060-A2 Photopolymerisable mixture, recording material manufactured therefrom and process for the production of copies HOECHST AKTIENGESELLSCHAFT (DE) 1990-03-21 EP disclosed
EP-0284938-A2 Photopolymerisable composition and registration material prepared therewith HOECHST AKTIENGESELLSCHAFT (DE) 1988-10-05 EP disclosed
US-4367280-A AROMATIC CARBONYL COMPOUND AND P-DIALKYLAMINO AROMATIC CARBONYL COMPOUND COMBINATION POLYMERIZATION INITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1983-01-04 US disclosed
US-4290870-A 5-ISOXOLONE, AROMATIC CARBONYL, DIALKYLAMINO AROMATIC CARBONYL OR FUJI PHOTO FILM CO., LTD. (JP) 1981-09-22 US disclosed
US-4259432-A HIGH SENSITIVITY TO ULTRAVIOLET RADIATION AND ARGON LASER RAYS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-31 US disclosed