Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FGFR1 | P11362 | 1/20 | 0.68 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.63 |
| ▸ | MAPT | P10636 | 5/20 | 0.63 |
| ▸ | MEN1 | O00255 | 4/20 | 0.63 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.63 |
| ▸ | POLB | P06746 | 3/20 | 0.63 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.63 |
| ▸ | RECQL | P46063 | 2/20 | 0.63 |
| ▸ | TLR9 | Q9NR96 | 2/20 | 0.63 |
| ▸ | USP2 | O75604 | 1/20 | 0.63 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.63 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.63 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.60 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.60 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.57 |
| ▸ | CNR2 | P34972 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.53 |
| ▸ | GAA | P10253 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10976207 | 1.00 | FGFR1 (0.68) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL2913259 | 1.00 | FGFR1 (0.68) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11144919 | 0.93 | CNR2 (0.67) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11148410 | 0.93 | FGFR1 (0.61) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11148412 | 0.93 | FGFR1 (0.61) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11144912 | 0.93 | CNR2 (0.67) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11140204 | 0.92 | ALDH1A1 (0.76) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11140200 | 0.92 | ALDH1A1 (0.76) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL8018019 | 0.89 | F3 (0.71) | FGFR1HSD17B3ALDH1A1MAPTMEN1 | |
| SCHEMBL11137142 | 0.89 | F3 (0.71) | FGFR1HSD17B3ALDH1A1MAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 375 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-116931266-A | Optical structure, preparation method thereof and AR display device | 华为技术有限公司 | 2023-10-24 | — | — | CN | claimed |
| CN-115160569-B | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-12-27 | — | — | CN | claimed |
| CN-115160569-A | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-10-11 | — | — | CN | claimed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | claimed |
| US-4415621-A | COATING A SUBSTRATE WITH AN AMORPHOUS BINDER AND DYE; TELEVISION; DISCS; ABSORPTION | EASTMAN KODAK COMPANY (US) | 1983-11-15 | — | — | US | claimed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | claimed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| US-4367280-A | AROMATIC CARBONYL COMPOUND AND P-DIALKYLAMINO AROMATIC CARBONYL COMPOUND COMBINATION POLYMERIZATION INITIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1983-01-04 | — | — | US | claimed |
| US-4290870-A | 5-ISOXOLONE, AROMATIC CARBONYL, DIALKYLAMINO AROMATIC CARBONYL OR | FUJI PHOTO FILM CO., LTD. (JP) | 1981-09-22 | — | — | US | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-09 | — | — | US | disclosed |
| US-4367280-A | AROMATIC CARBONYL COMPOUND AND P-DIALKYLAMINO AROMATIC CARBONYL COMPOUND COMBINATION POLYMERIZATION INITIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1983-01-04 | — | — | US | disclosed |
| US-4315982-A | Styryl pyrazoline compounds, process for production thereof, and electrophoto graphic material comprising said compounds | COPYER CO., LTD. (JP) | 1982-02-16 | — | — | US | disclosed |
| US-4290870-A | 5-ISOXOLONE, AROMATIC CARBONYL, DIALKYLAMINO AROMATIC CARBONYL OR | FUJI PHOTO FILM CO., LTD. (JP) | 1981-09-22 | — | — | US | disclosed |
| US-4264710-A | AN ETHYLENICALLY UNSATURATED COMPOUND, AND A PHOTOPOLYMERIZATION INIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1981-04-28 | — | — | US | disclosed |
| US-4259432-A | HIGH SENSITIVITY TO ULTRAVIOLET RADIATION AND ARGON LASER RAYS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | FGFR1 2163/4885HSD17B3 4700/4885ALDH1A1 3316/4885 |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | FGFR1 3821/4885HSD17B3 4432/4885ALDH1A1 3706/4885 |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | CD79B, ITGA1, PTK2 | FGFR1 3442/4885HSD17B3 3762/4885ALDH1A1 413/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.