SCHEMBL802169

SCHEMBL802169

Cc1ccc(OC(=O)C(=CC=CN(C)C)S(=O)(=O)c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.46
▸ KMT2A Q03164 5/20 0.46
▸ SMN1; SMN2 Q16637 4/20 0.46
▸ RAB9A P51151 2/20 0.46
▸ PTGES O14684 1/20 0.40
▸ MEN1 O00255 3/20 0.39
▸ CA12 O43570 1/20 0.39
▸ CA9 Q16790 1/20 0.39
▸ MAPT P10636 2/20 0.38
▸ GAA P10253 1/20 0.37
▸ GLA P06280 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.36
▸ HTT P42858 1/20 0.36
▸ NPC1 O15118 1/20 0.35
▸ POLB P06746 1/20 0.35
▸ HSP90AA1 P07900 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12758255 0.88 ALDH1A1 (0.40) ALDH1A1KMT2ASMN1; SMN2RAB9APTGES
SCHEMBL16019688 0.85 ALDH1A1 (0.38) ALDH1A1KMT2ASMN1; SMN2RAB9APTGES
SCHEMBL13609923 0.82 ALDH1A1 (0.48) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL805450 0.82 ALDH1A1 (0.48) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL15701363 0.82 ALDH1A1 (0.45) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL18415027 0.81 ALDH1A1 (0.46) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL14998033 0.81 ALDH1A1 (0.56) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL12864658 0.81 ALDH1A1 (0.46) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL20707153 0.79 ALDH1A1 (0.48) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1
SCHEMBL10678505 0.74 ALDH1A1 (0.42) ALDH1A1KMT2ASMN1; SMN2RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8766388-B2 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition FUJIFILM CORPORATION (JP) 2014-07-01 — — US disclosed
US-20120068292-A1 POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-03-22 — — US disclosed
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