SCHEMBL8022872

SCHEMBL8022872

CCCCOB(OCCCC)Oc1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.53
KCNA3 P22001 1/20 0.40
PCSK9 Q8NBP7 1/20 0.40
MLNR O43193 1/20 0.40
NR1I2 O75469 1/20 0.40
ESR1 P03372 1/20 0.40
NR3C1 P04150 1/20 0.40
PGR P06401 1/20 0.40
ADRB2 P07550 1/20 0.40
CHRM2 P08172 1/20 0.40
ADRB1 P08588 1/20 0.40
HTR1A P08908 1/20 0.40
ADRA2A P08913 1/20 0.40
ADORA3 P0DMS8 1/20 0.40
CHRM1 P11229 1/20 0.40
DRD2 P14416 1/20 0.40
ADRA2B P18089 1/20 0.40
ADRA2C P18825 1/20 0.40
CHRM3 P20309 1/20 0.40
MAOA P21397 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2036432 0.91 LTA4H (0.53) LTA4HKCNA3PCSK9MLNRNR1I2
SCHEMBL5829405 0.89 LTA4H (0.51) LTA4HKCNA3MLNRNR1I2ESR1
SCHEMBL28209850 0.87 LTA4H (0.45) LTA4HPCSK9MLNRNR1I2ESR1
SCHEMBL7148125 0.87 LTA4H (0.45) LTA4HKCNA3PCSK9MLNRNR1I2
SCHEMBL3729896 0.81 LTA4H (0.50) LTA4HPCSK9MLNRNR1I2ESR1
Boric Acid SCHEMBL28209851 0.80 LTA4H (0.49) LTA4HPCSK9MLNRNR1I2ESR1
SCHEMBL4302474 0.79 LTA4H (0.43) LTA4HKCNA3LMNATSHRL3MBTL1
Butylamine SCHEMBL1146611 0.77 LTA4H (0.44) LTA4HPCSK9MLNRNR1I2ESR1
SCHEMBL4849454 0.77 LTA4H (0.50) LTA4HKCNA3PCSK9MLNRNR1I2
SCHEMBL14983318 0.76 LTA4H (0.52) LTA4HKCNA3PCSK9MLNRNR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120183888-A1 PHOTOPOLYMER FOR VOLUME HOLOGRAPHIC RECORDING AND ITS PRODUCTION PROCESS OLIVEIRA SERGIO ASSUMPCAO (BR) 2012-07-19 US claimed
US-10242874-B2 Diffusing agent composition and method of manufacturing semiconductor substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2019-03-26 US disclosed
US-20180374704-A1 DIFFUSING AGENT COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2018-12-27 US disclosed
US-6110357-A ADDING BORON COMPOUND TO HYDROCARBON OIL FEED IN CATALYTIC CRACKING ZONE HAVING ZEOLITE CATALYST INCLUDING NICKEL VANADIUM, ZIRCONIUM, ANTIMONY TO INCORPORATE BORON INTO CATALYST TO INCREASE YIELD OF GASOLINE AND LIGHT CYCLE OIL PHILLIPS PETROLEUM COMPANY (US) 2000-08-29 US disclosed
EP-0197311-B1 PROCESS FOR POLYMERIZING ETHYLENE MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1991-12-18 EP disclosed
US-4762898-A Process for polymerizing ethylene MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1988-08-09 US disclosed
EP-0197311-A2 Process for polymerizing ethylene MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1986-10-15 EP disclosed