SCHEMBL8023819

SCHEMBL8023819

O=[Si]([O-])[O-].O=[Si]([O-])[O-].O=[Si]([O-])[O-].[Mg+2].[Mg+2].[Na+].[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ATP4AATP4BGABBR1GABBR2HMGCR

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL54724 1.00
Water SCHEMBL15312360 0.94
Fluoride Ion SCHEMBL892977 0.94
SCHEMBL3272408 0.94
Water SCHEMBL8933649 0.94
SCHEMBL2472591 0.94
Lithium Ion SCHEMBL45641 0.94
SCHEMBL11209185 0.94
Hydrochloric Acid SCHEMBL11808042 0.94
SCHEMBL9126752 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6156472-A CLEANING THE SURFACE OF AN ALUMINUM SUBSTRATE WITH WATER CONTAINING A SILICATE INHIBITOR; THEN FORMING A FUNCTIONAL FILM OF AN AMORPHOUS SILICON ATOMS AS A MATRIX ON SUBSTRATE BY LOW PRESSURE VAPOR DEPOSITION; CORROSION RESISTANCE CANON KABUSHIKI KAISHA (JP) 2000-12-05 US disclosed