SCHEMBL8030690

SCHEMBL8030690

Nc1ccc(O)c(S(=O)(=O)O)c1S(=O)(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
HSD17B10 Q99714 3/20 0.50
CSNK2A2 P19784 1/20 0.45
CSNK2B P67870 1/20 0.45
CSNK2A1 P68400 1/20 0.45
CSNK2A3 Q8NEV1 1/20 0.45
NQO1 P15559 1/20 0.42
GAA P10253 3/20 0.42
MAPT P10636 2/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
AURKA O14965 1/20 0.42
AURKB Q96GD4 1/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
KDM4E B2RXH2 1/20 0.41
PKM P14618 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8164868 0.88 ALDH1A1 (0.46) ALDH1A1HSD17B10CSNK2A2CSNK2BCSNK2A1
SCHEMBL30451951 0.85 HSD17B10 (0.44) ALDH1A1HSD17B10GAAMAPTCA12
SCHEMBL1889215 0.85 HSD17B10 (0.44) ALDH1A1HSD17B10GAAMAPTCA12
SCHEMBL9301134 0.84 ALDH1A1 (0.48) ALDH1A1HSD17B10CSNK2A2CSNK2BCSNK2A1
SCHEMBL19730612 0.84 ALDH1A1 (0.48) ALDH1A1HSD17B10CSNK2A2CSNK2BCSNK2A1
Water SCHEMBL28047497 0.83 HSD17B10 (0.43) ALDH1A1HSD17B10NQO1GAAMAPT
Hydrochloric Acid SCHEMBL11264856 0.83 ALDH1A1 (0.47) ALDH1A1HSD17B10CSNK2A2CSNK2BCSNK2A1
SCHEMBL5181911 0.81 ALDH1A1 (0.41) ALDH1A1HSD17B10CSNK2A2CSNK2BCSNK2A1
SCHEMBL28054299 0.81 ALDH1A1 (0.46) ALDH1A1HSD17B10CSNK2A2CSNK2BCSNK2A1
SCHEMBL1755214 0.80 AURKA (0.49) ALDH1A1HSD17B10GAAMAPTCA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6139973-A THIN SULFURIZING LAYER HAVING HIGH IRON-SULFIDE CONTENT IS FORMED BY AN ELECTROLYTIC DEPOSITION METHOD USING AN ALKALINE ELECTROLYTIC SOLUTION WHICH CONTAINS FERRIC IONS, SULFIDE AND A CHELATING AGENT OF THE FERRIC IONS. NIHON PARKERIZING CO., LTD (JP) 2000-10-31 US disclosed