SCHEMBL8036255

SCHEMBL8036255

[CH2]CCCOc1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1B P28222 6/20 0.41
KMT2A Q03164 2/20 0.41
MEN1 O00255 1/20 0.41
ALDH1A1 P00352 3/20 0.40
HPGD P15428 3/20 0.40
HSD17B10 Q99714 3/20 0.40
CYP3A4 P08684 2/20 0.40
TSHR P16473 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
KCNA3 P22001 1/20 0.40
SLC6A4 P31645 2/20 0.38
HRH1 P35367 1/20 0.38
CYP1A2 P05177 3/20 0.38
CYP1A1 P04798 1/20 0.38
CYP1B1 Q16678 1/20 0.38
ERBB2 P04626 1/20 0.38
FYN P06241 1/20 0.38
MAOA P21397 1/20 0.38
ACHE P22303 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19138188 0.83 CNR2 (0.51) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL28358811 0.81 KCNA3 (0.42) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL8916479 0.81 CNR1 (0.51) HTR1BALDH1A1HPGDHSD17B10CYP3A4
SCHEMBL8064322 0.81 IDO1 (0.50) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL28355176 0.81 ALDH1A1 (0.41) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL3999003 0.80 CNR1 (0.52) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL20678376 0.80 CNR1 (0.52) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL20678369 0.80 CNR1 (0.52) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL20678483 0.80 CNR1 (0.52) HTR1BKMT2AMEN1ALDH1A1HPGD
SCHEMBL28418856 0.80 CNR1 (0.52) HTR1BKMT2AMEN1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed