SCHEMBL8046984

SCHEMBL8046984

O=S(=O)(c1ccccc1)c1ccc(OCC2CO2)c(S(=O)(=O)c2ccccc2)c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.57
PKM P14618 2/20 0.57
LMNA P02545 2/20 0.57
GAA P10253 1/20 0.57
GLA P06280 1/20 0.46
TDP1 Q9NUW8 1/20 0.45
CHRM2 P08172 3/20 0.43
CHRM5 P08912 3/20 0.43
CHRM3 P20309 2/20 0.43
PRMT5 O14744 1/20 0.41
WDR77 Q9BQA1 1/20 0.41
HTR6 P50406 3/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
TP53 P04637 1/20 0.41
CYP3A4 P08684 1/20 0.41
TSHR P16473 1/20 0.41
HIF1A Q16665 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8064302 0.88 ALDH1A1 (0.56) ALDH1A1PKMLMNAGAAGLA
SCHEMBL6704543 0.86 ALDH1A1 (0.55) ALDH1A1PKMLMNAGAAGLA
SCHEMBL8431130 0.84 ALDH1A1 (0.52) ALDH1A1PKMLMNAGAAGLA
SCHEMBL13479258 0.83 ALDH1A1 (0.52) ALDH1A1PKMLMNAGAAGLA
SCHEMBL3149448 0.82 ALDH1A1 (0.51) ALDH1A1PKMLMNAGAAGLA
SCHEMBL3154963 0.82 ALDH1A1 (0.51) ALDH1A1PKMLMNAGAAGLA
SCHEMBL5495247 0.82 ALDH1A1 (0.51) ALDH1A1PKMLMNAGAAGLA
SCHEMBL3149456 0.82 ALDH1A1 (0.51) ALDH1A1PKMLMNAGAAGLA
SCHEMBL8057519 0.81 ALDH1A1 (0.47) ALDH1A1PKMLMNAGAAGLA
SCHEMBL6297248 0.80 ALDH1A1 (0.88) ALDH1A1PKMLMNAGAAGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed