SCHEMBL8047276

SCHEMBL8047276

CCCCCCCCCCCCCCCCn1[c]ccc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TBXAS1 P24557 1/20 0.37
NPC1 O15118 7/20 0.36
RAB9A P51151 7/20 0.36
HTT P42858 6/20 0.36
MAPK1 P28482 3/20 0.36
NPSR1 Q6W5P4 3/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
LMNA P02545 3/20 0.36
GALR3 O60755 2/20 0.36
POLB P06746 2/20 0.36
ATM Q13315 2/20 0.36
HSP90AA1 P07900 2/20 0.36
MAPT P10636 2/20 0.36
APOBEC3A P31941 2/20 0.36
APOBEC3G Q9HC16 2/20 0.36
KDM4E B2RXH2 1/20 0.36
RAD52 P43351 1/20 0.36
PAX8 Q06710 1/20 0.36
NR2F2 P24468 1/20 0.36
NOD2 Q9HC29 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2452614 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2964741 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2973287 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2972679 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2968949 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2963815 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2964229 1.00 TBXAS1 (0.37) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2972482 0.98 NPC1 (0.34) TBXAS1NPC1RAB9AHTTMAPK1
SCHEMBL2970473 0.82
SCHEMBL6015943 0.75 CYP2D6 (0.42) RAB9AMAPK1NPSR1SMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed