SCHEMBL8048490

SCHEMBL8048490

CC(C)COc1cccc(C(C)[O])c1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TRIM24 O15164 1/20 0.47
NR1H4 Q96RI1 1/20 0.45
FOS P01100 1/20 0.44
JUN P05412 1/20 0.44
SIRT2 Q8IXJ6 1/20 0.44
KDM4E B2RXH2 2/20 0.43
TSHR P16473 1/20 0.43
KAT6A Q92794 1/20 0.42
MTNR1A P48039 3/20 0.41
MTNR1B P49286 3/20 0.41
DUT P33316 1/20 0.41
XDH P47989 1/20 0.40
ALDH1A1 P00352 1/20 0.40
LMNA P02545 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HSD17B1 P14061 1/20 0.40
HSD17B2 P37059 1/20 0.40
ACACB O00763 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7263660 0.86 TRIM24 (0.43) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL7955852 0.85 KDM4E (0.57) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL8045881 0.84 TP53 (0.52) KDM4ETSHRALDH1A1LMNASMN1; SMN2
SCHEMBL2967940 0.82 TRIM24 (0.55) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL19191664 0.82 SCN4A (0.46) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL14846857 0.82 SCN4A (0.46) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL12094272 0.82 SCN4A (0.46) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL18713702 0.81 TSHR (0.45) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL19121486 0.81 HDAC4 (0.46) TRIM24NR1H4FOSJUNSIRT2
SCHEMBL3034246 0.81 KMT2A (0.53) KDM4ETSHRALDH1A1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed