Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12325182 | 0.91 | TSHR (0.47) | TSHRESR2 | |
| SCHEMBL805167 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL24477678 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL24477586 | 0.91 | TSHR (0.40) | TSHR | |
| SCHEMBL12325179 | 0.85 | LMNA (0.32) | TSHR | |
| SCHEMBL18757012 | 0.84 | TSHR (0.41) | TSHRESR2 | |
| SCHEMBL22875519 | 0.80 | TSHR (0.47) | TSHR | |
| SCHEMBL151744 | 0.80 | TSHR (0.41) | TSHR | |
| SCHEMBL9815822 | 0.80 | TSHR (0.41) | TSHR | |
| SCHEMBL21183329 | 0.78 | PTGS1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8795945-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795945-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20120301831-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20120301831-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20120070594-A1 | HYDROGENATED BISPHENOL-A-BASED POLYMERS AS SUBSTITUTES FOR BISPHENOL-A-BASED POLYMERS | EMPIRE TECHNOLOGY DEVELOPMENT LLC | 2012-03-22 | — | — | US | disclosed |
| WO-2011111805-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-15 | — | — | WO | disclosed |