SCHEMBL8053577

SCHEMBL8053577

CCCCCCCCN(CCCC[O])CCCCCCCC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 4/20 0.48
KDM5A P29375 3/20 0.43
PHF8 Q9UPP1 2/20 0.43
KDM4C Q9H3R0 1/20 0.43
THRB P10828 2/20 0.42
TSHR P16473 1/20 0.42
ICMT O60725 1/20 0.40
ALB P02768 1/20 0.40
MCHR1 Q99705 1/20 0.39
KCNH2 Q12809 3/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
S1PR2 O95136 1/20 0.38
S1PR1 P21453 1/20 0.38
S1PR3 Q99500 1/20 0.38
S1PR5 Q9H228 1/20 0.38
ADH1C P00326 1/20 0.38
ADH1A P07327 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4394110 0.95 DNM1 (0.48) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL7297600 0.92 KDM5A (0.42) DNM1KDM5APHF8KDM4CICMT
SCHEMBL10437739 0.90 DNM1 (0.48) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL2754194 0.86 DNM1 (0.43) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL24113600 0.86 DNM1 (0.61) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL17599281 0.86 DNM1 (0.61) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL36579 0.86 DNM1 (0.61) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL11864927 0.86 DNM1 (0.61) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL14802918 0.86 DNM1 (0.61) DNM1KDM5APHF8KDM4CTHRB
SCHEMBL9503161 0.86 DNM1 (0.61) DNM1KDM5APHF8KDM4CTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed