SCHEMBL8055874

SCHEMBL8055874

O=S(=O)(Cc1ccccc1)Oc1cccc(O)c1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.56
HTT P42858 1/20 0.45
CA1 P00915 3/20 0.44
CA2 P00918 3/20 0.44
CA9 Q16790 2/20 0.44
CA5A P35218 1/20 0.44
MMP1 P03956 1/20 0.41
MMP2 P08253 1/20 0.41
MMP9 P14780 1/20 0.41
MMP8 P22894 1/20 0.41
MMP13 P45452 1/20 0.41
PRSS1 P07477 2/20 0.40
PRSS2 P07478 2/20 0.40
PRSS3 P35030 2/20 0.40
ELANE P08246 2/20 0.40
KDM4E B2RXH2 2/20 0.40
ALDH1A1 P00352 2/20 0.40
MAPT P10636 2/20 0.40
HPGD P15428 2/20 0.40
ALOX15 P16050 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8055872 0.83 KMT2A (0.59) KMT2AHTTCA1CA2CA9
SCHEMBL29974341 0.81 KMT2A (0.61) KMT2AHTTCA1CA2CA9
SCHEMBL28833567 0.79 ALDH1A1 (0.50) KMT2ACA1CA2CA9MMP2
Phenylmethanesulfonic Acid SCHEMBL5379639 0.77 CA1 (0.52) KMT2ACA1CA2CA9CA5A
SCHEMBL1549000 0.77 KMT2A (0.56) KMT2AHTTCA1CA2CA9
SCHEMBL28811390 0.75 KMT2A (0.54) KMT2AHTTCA1CA2CA9
SCHEMBL3137847 0.75 KMT2A (0.50) KMT2AHTTCA1CA2CA9
SCHEMBL943543 0.75 KMT2A (0.58) KMT2AHTTCA1CA2CA9
SCHEMBL4681008 0.75 KMT2A (0.58) KMT2AHTTCA1CA2CA9
Hydrochloric Acid SCHEMBL12474467 0.75 KMT2A (0.58) KMT2AHTTCA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0749044-B1 Positive-working photoresist composition TOKYO OHKA KOGYO CO LTD (JP) 2000-09-06 EP disclosed
EP-0749046-B1 Positive-working photoresist composition TOKYO OHKA KOGYO CO LTD (JP) 2000-05-10 EP disclosed
US-5948589-A HIGH SENSITIVITY AND HIGH RESOLUTION CAPABLE OF EXHIBITING HIGH STABILITY OF LATENT IMAGES; TERT-BUTYOXYCARBONYL-SUBSTITUTED POLYVINYLPHENOL AND ALKOXYALKYL-SUBSTITUTED POLYVINYLPHENOL. TOKYO OHKA KOGYO CO., LTD. (JP) 1999-09-07 US disclosed
US-5874195-A Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-02-23 US disclosed
US-5856058-A HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. TOKYO OHKA KOGYO CO., LTD. (JP) 1999-01-05 US disclosed
US-5770343-A Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-06-23 US disclosed
EP-0749046-A1 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed
EP-0749044-A2 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed