SCHEMBL8066728

SCHEMBL8066728

CC(CC(C)(C)C)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28756046 0.76
SCHEMBL28610109 0.75 HRH3 (0.32)
SCHEMBL1075261 0.75 MAPK1 (0.40)
SCHEMBL17708098 0.73
SCHEMBL11938124 0.73
SCHEMBL18254224 0.73
SCHEMBL4764606 0.73
SCHEMBL11922156 0.71 MAPK1 (0.31)
SCHEMBL9913176 0.71 MAPK1 (0.31)
SCHEMBL11922164 0.71 MAPK1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0761700-B1 Propylene-ethylene random copolymer, process for producing the same and film thereof SUMITOMO CHEMICAL CO (JP) 2000-07-05 EP disclosed
US-6057413-A HEAT SEALING FILM WITH HAZE FORMED BY MELT EXTRUSION OF COPOLYMER IN THE ABSENCE OF SOLVENT IN THE PRESENCE OF CATALYST SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-05-02 US disclosed
EP-0761700-A2 Propylene-ethylene random copolymer, process for producing the same and film thereof SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1997-03-12 EP disclosed