⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7131245 | 0.86 | — | — | |
| SCHEMBL15499281 | 0.67 | — | — | |
| SCHEMBL15499280 | 0.67 | — | — | |
| SCHEMBL24865884 | 0.65 | — | — | |
| SCHEMBL13329208 | 0.64 | — | — | |
| SCHEMBL680598 | 0.61 | — | — | |
| SCHEMBL3224474 | 0.60 | — | — | |
| SCHEMBL90094 | 0.60 | — | — | |
| SCHEMBL18015136 | 0.59 | — | — | |
| SCHEMBL18704856 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 508 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260090302-A1 | Etch Process and a Processing Assembly | ASM IP HOLDING B.V. (NL) | 2026-03-26 | — | — | US | claimed |
| US-12394634-B2 | Etch process and a processing assembly | ASM IP Holding, B.V. (NL) | 2025-08-19 | — | — | US | claimed |
| US-20240363358-A1 | METHODS FOR CHEMICALLY ETCHING A TARGET LAYER | ASM IP HOLDING B.V. (NL) | 2024-10-31 | — | — | US | claimed |
| CN-118866679-A | Method for chemically etching a target layer | ASM IP私人控股有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-118653165-A | Fluorine-doped self-supporting carbon electrode material and preparation method and application thereof | 山西龙兴能源科技有限公司 | 2024-09-17 | — | — | CN | claimed |
| CN-118406404-A | Circuit board ink-jet printing ink stripping agent and preparation method and application thereof | 珠海市板明科技有限公司 | 2024-07-30 | — | — | CN | claimed |
| CN-114685283-B | Preparation method of 1- (fluoromethyl) cyclopropylamine hydrochloride | 南京艾康生物科技有限公司 | 2024-02-27 | — | — | CN | claimed |
| CN-117327322-A | Preparation method of modified polyether-ether-ketone with antibacterial property on surface | 吉林大学 | 2024-01-02 | — | — | CN | claimed |
| US-20230159865-A1 | METHOD FOR SELECTIVELY REMOVING OXIDE FROM A SURFACE | ASM IP HOLDING B.V. (NL) | 2023-05-25 | — | — | US | claimed |
| CN-114685283-A | Preparation method of 1- (fluoromethyl) cyclopropylamine hydrochloride | 南京艾康生物科技有限公司 | 2022-07-01 | — | — | CN | claimed |
| EP-1439170-A1 | Fluorinating reactants and process for their preparation | Bayer Chemicals AG (DE) | 2004-07-21 | — | — | EP | claimed |
| US-20030004348-A1 | Halogenating agents | SONODA HIROSHI (JP) | 2003-01-02 | — | — | US | claimed |
| EP-0949226-B1 | Process for the preparation of acetylene derivatives | MITSUI CHEMICALS INC (JP) | 2002-07-17 | — | — | EP | claimed |
| US-20020042521-A1 | Nitrogen-based halogenating agents and process for preparing halogen-containing compounds | SONODA HIROSHI (JP) | 2002-04-11 | — | — | US | claimed |
| US-6344579-B1 | REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND | MITSUI CHEMICALS, INC. (JP) | 2002-02-05 | — | — | US | claimed |
| US-6329529-B1 | FOR FLUORINATING OF ORGANIC COMPOUNDS, EFFICIENCY, POLLUTION CONTROL | MITSUI CHEMICALS, INC. (JP) | 2001-12-11 | — | — | US | claimed |
| EP-1138633-A1 | PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND | Mitsui Chemicals, Inc. (JP) | 2001-10-04 | — | — | EP | claimed |
| US-6127583-A | Process for preparing acetylene derivative from a ketone compound | MITSUI CHEMICALS, INC. (JP) | 2000-10-03 | — | — | US | claimed |
| EP-0949226-A1 | Process for the preparation of acetylene derivatives | Mitsui Chemicals, Inc. (JP) | 1999-10-13 | — | — | EP | claimed |
| EP-0895991-A2 | Halogenating agent | Mitsui Chemicals, Inc. (JP) | 1999-02-10 | — | — | EP | claimed |