SCHEMBL90094

SCHEMBL90094

CN1CCCC1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL90401 0.92
SCHEMBL90164 0.74
SCHEMBL1753465 0.69 SOS1 (0.32)
SCHEMBL7131245 0.69
SCHEMBL30065459 0.67
SCHEMBL90801 0.67
SCHEMBL14962053 0.67 SOS1 (0.52)
SCHEMBL14962054 0.67
SCHEMBL766013 0.67
SCHEMBL12314024 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11548888-B2 KRas G12C inhibitors Mirati Therapeutics, Inc. (US) 2023-01-10 US disclosed
EP-3303326-B1 HETEROCYCLIC ESTROGEN RECEPTOR MODULATORS AND USES THEREOF HOFFMANN LA ROCHE (CH) 2020-12-16 EP disclosed
US-20160347742-A1 HETEROCYCLIC ESTROGEN RECEPTOR MODULATORS AND USES THEREOF GENENTECH, INC. (US) 2016-12-01 US disclosed
WO-2016189011-A1 HETEROCYCLIC ESTROGEN RECEPTOR MODULATORS AND USES THEREOF F. HOFFMANN-LA ROCHE AG (CH) 2016-12-01 WO disclosed
EP-2154141-B1 Precursors for depositing silicon-containing films and methods using same AIR PROD & CHEM (US) 2016-06-15 EP disclosed
US-9302988-B2 Fluoromethyl-substituted pyrrole carboxamides Grünenthal GmbH (DE) 2016-04-05 US disclosed
EP-2644609-B1 Precursors for depositing silicon-containing films and methods of using same AIR PROD & CHEM (US) 2015-07-08 EP disclosed
US-20140066426-A1 FLUOROMETHYL-SUBSTITUTED PYRROLE CARBOXAMIDES GRUENENTHAL GMBH (DE) 2014-03-06 US disclosed
EP-2644609-A2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-02 EP disclosed
US-8129555-B2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-06 US disclosed
US-8129555-B2 Precursors for depositing silicon-containing films and methods for making and using same AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-06 US disclosed
US-20100041243-A1 Precursors for Depositing Silicon-containing Films and Methods for Making and Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
US-20100041243-A1 Precursors for Depositing Silicon-containing Films and Methods for Making and Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed