SCHEMBL8076063

SCHEMBL8076063

CCCCCC(C)C(C)N

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.62
SPHK1 Q9NYA1 2/20 0.56
TP53 P04637 2/20 0.48
LAP3 P28838 2/20 0.43
S1PR2 O95136 5/20 0.42
S1PR1 P21453 5/20 0.42
S1PR3 Q99500 5/20 0.42
S1PR4 O95977 4/20 0.42
CYP2D6 P10635 2/20 0.41
PLA2G1B P04054 1/20 0.41
PLA2G2A P14555 1/20 0.41
GMNN O75496 1/20 0.41
LMNA P02545 1/20 0.41
POLB P06746 1/20 0.41
THPO P40225 1/20 0.41
MTOR P42345 1/20 0.41
BLM P54132 1/20 0.41
KDM4E B2RXH2 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23844314 1.00 OPRM1 (0.62) OPRM1SPHK1TP53LAP3S1PR2
SCHEMBL22182954 0.97 SPHK1 (0.60) OPRM1SPHK1TP53LAP3S1PR2
SCHEMBL18697931 0.97 SPHK1 (0.60) OPRM1SPHK1TP53LAP3S1PR2
SCHEMBL22986835 0.97 SPHK1 (0.60) OPRM1SPHK1TP53LAP3S1PR2
SCHEMBL23653504 0.97 SPHK1 (0.60) OPRM1SPHK1TP53LAP3S1PR2
SCHEMBL17351133 0.97 SPHK1 (0.60) OPRM1SPHK1TP53LAP3S1PR2
SCHEMBL13637913 0.97 SPHK1 (0.60) OPRM1SPHK1TP53LAP3S1PR2
Hydrochloric Acid SCHEMBL30777659 0.95 SPHK1 (0.58) OPRM1SPHK1TP53LAP3S1PR2
Hydrochloric Acid SCHEMBL29024047 0.95 SPHK1 (0.58) OPRM1SPHK1TP53LAP3S1PR2
Hydrochloric Acid SCHEMBL28271053 0.95 SPHK1 (0.58) OPRM1SPHK1TP53LAP3S1PR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11563083-B2 Dual side contact structures in semiconductor devices TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-01-24 US disclosed
US-9700292-B2 Systems and methods for surgical and interventional planning, support, post-operative follow-up, and functional recovery tracking DePuy Synthes Products, Inc. (US) 2017-07-11 US disclosed
CN-104271537-B Polymer forms the oligomeric of the olefin(e) compound reducing 沙索技术有限公司 2017-03-08 CN disclosed
CN-104271537-A Oligomerisation of olefinic compounds with reduced polymer formation SASOL TECH PTY LTD 2015-01-07 CN disclosed
EP-0846679-B1 Process for preparing 1,3-disubstituted urea SUMIKA FINE CHEMICALS CO LTD (JP) 2000-09-06 EP disclosed
US-5902899-A Process for preparing 1, 3-disubstituted urea SUMIKA FINE CHEMICALS CO., LTD. (JP) 1999-05-11 US disclosed
EP-0846679-A2 Process for preparing 1,3-disubstituted urea SUMIKA FINE CHEMICALS Co., Ltd. (JP) 1998-06-10 EP disclosed
EP-0010256-B1 PROCESS FOR PREPARING SYMMETRIC 1,3-DISUBSTITUTED UREAS BASF Aktiengesellschaft (DE) 1982-12-29 EP disclosed
EP-0010256-A2 Process for preparing symmetric 1,3-disubstituted ureas BASF Aktiengesellschaft (DE) 1980-04-30 EP disclosed