SCHEMBL8078201

SCHEMBL8078201

Cc1cc(Cc2cc(C)c(O)c(C)c2)c(O)c(Cc2cc(C)c(O)c(C)c2)c1.Cc1cc(Cc2ccc(O)c(C)c2)c(O)c(Cc2ccc(O)c(C)c2)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.61
ESR2 Q92731 1/20 0.61
AMY1A P0DUB6 1/20 0.54
SHBG P04278 1/20 0.43
TP53 P04637 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CYP2C9 P11712 3/20 0.41
CYP2C19 P33261 3/20 0.41
HIF1A Q16665 2/20 0.41
PTGS1 P23219 1/20 0.41
PTGS2 P35354 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CYP2D6 P10635 2/20 0.41
HSD17B10 Q99714 2/20 0.41
MAPT P10636 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
THRA P10827 1/20 0.40
THRB P10828 1/20 0.40
HSPA5 P11021 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4065316 0.95 ESR1 (0.59) ESR1ESR2AMY1ASHBGTP53
SCHEMBL3188653 0.95 ESR1 (0.68) ESR1ESR2AMY1ASHBGTP53
SCHEMBL29636485 0.95 ESR1 (0.68) ESR1ESR2AMY1ASHBGTP53
SCHEMBL4064258 0.93 ESR1 (0.66) ESR1ESR2AMY1ASHBGTP53
SCHEMBL7938659 0.93 ESR1 (0.66) ESR1ESR2AMY1ASHBGTP53
SCHEMBL30375410 0.93 ESR1 (0.66) ESR1ESR2AMY1ASHBGTP53
SCHEMBL14395905 0.92 ESR1 (0.63) ESR1ESR2AMY1ASHBGTP53
SCHEMBL10136215 0.90 AMY1A (0.60) ESR1ESR2AMY1ASHBGCYP2C9
SCHEMBL18643618 0.90 ESR1 (0.53) ESR1ESR2AMY1ASHBGTP53
SCHEMBL14462649 0.88 ESR1 (0.63) ESR1ESR2AMY1ASHBGTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0745575-B1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO LTD (JP) 2000-09-06 EP disclosed
EP-0745575-A1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO., LTD. (JP) 1996-12-04 EP disclosed