Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Oxalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8613885 | 0.84 | CYP2D6 (0.38) | CYP2D6CYP2C19 | |
| SCHEMBL32689218 | 0.81 | CYP2D6 (0.41) | CYP2D6CYP2C19 | |
| SCHEMBL7638350 | 0.79 | CYP2D6 (0.39) | CYP2D6CYP2C19 | |
| SCHEMBL5837479 | 0.78 | CYP2D6 (0.35) | CYP2D6CYP2C19EPHX2 | |
| SCHEMBL350877 | 0.78 | CYP2D6 (0.46) | CYP2D6CYP2C19 | |
| SCHEMBL32688908 | 0.77 | CYP2D6 (0.38) | CYP2D6CYP2C19EPHX2 | |
| SCHEMBL9317520 | 0.76 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL710692 | 0.76 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL5837266 | 0.75 | CYP2D6 (0.34) | CYP2D6CYP2C19 | |
| SCHEMBL5837412 | 0.75 | TSHR (0.33) | CYP2D6CYP2C19EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1021750-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| EP-1021477-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| WO-1999014256-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |
| WO-1999014635-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |