SCHEMBL8083241

SCHEMBL8083241

Cc1cc(Cc2cc(-c3ccccc3)cc(Cc3ccc(O)c(C)c3)c2O)ccc1O.Cc1cc(Cc2cc(C)c(O)cc2C)c(O)c(Cc2cc(C)c(O)cc2C)c1

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 6/20 0.45
ESR2 Q92731 6/20 0.45
AMY1A P0DUB6 1/20 0.44
PTPN1 P18031 2/20 0.41
PTPN2 P17706 1/20 0.41
PTPN6 P29350 1/20 0.41
CYP2C9 P11712 2/20 0.37
CYP2C19 P33261 2/20 0.37
HIF1A Q16665 2/20 0.37
CYP2D6 P10635 1/20 0.37
HSD17B10 Q99714 1/20 0.37
LDHA P00338 2/20 0.35
LDHB P07195 2/20 0.35
HSD17B1 P14061 1/20 0.35
HSD17B2 P37059 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
IDH1 O75874 2/20 0.34
CYP1A2 P05177 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16081299 0.90 ESR1 (0.56) ESR1ESR2AMY1ACYP2C9CYP2C19
SCHEMBL6848727 0.88 ESR1 (0.58) ESR1ESR2AMY1APTPN1PTPN2
SCHEMBL7774721 0.87 PTPN1 (0.51) ESR1ESR2AMY1APTPN1PTPN2
SCHEMBL7938659 0.83 ESR1 (0.66) ESR1ESR2AMY1ACYP2C9CYP2C19
SCHEMBL4064258 0.83 ESR1 (0.66) ESR1ESR2AMY1ACYP2C9CYP2C19
SCHEMBL30375410 0.83 ESR1 (0.66) ESR1ESR2AMY1ACYP2C9CYP2C19
SCHEMBL3188653 0.81 ESR1 (0.68) ESR1ESR2AMY1ACYP2C9CYP2C19
SCHEMBL29636485 0.81 ESR1 (0.68) ESR1ESR2AMY1ACYP2C9CYP2C19
SCHEMBL13609056 0.81 ESR1 (0.68) ESR1ESR2AMY1APTPN1CYP2C9
SCHEMBL8347901 0.80 ESR1 (0.70) ESR1ESR2CYP2C9CYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0745575-B1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO LTD (JP) 2000-09-06 EP disclosed
EP-0745575-A1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO., LTD. (JP) 1996-12-04 EP disclosed