SCHEMBL8087527

SCHEMBL8087527

CCC(CO)(CO)COCCCCO

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 2/20 0.39
CYP4A11 Q02928 2/20 0.39
THRB P10828 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
HTT P42858 1/20 0.38
MAPT P10636 1/20 0.38
TSHR P16473 2/20 0.37
CES1 P23141 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.33
LMNA P02545 2/20 0.32
ALDH1A1 P00352 2/20 0.32
HSD17B10 Q99714 1/20 0.32
GAA P10253 1/20 0.32
GBA2 Q9HCG7 2/20 0.30
ACHE P22303 3/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11284350 0.98 THRB (0.41) CYP4F2CYP4A11THRBMEN1KMT2A
SCHEMBL11277784 0.98 THRB (0.41) CYP4F2CYP4A11THRBMEN1KMT2A
SCHEMBL8966981 0.94 TSHR (0.38) CYP4F2CYP4A11THRBMEN1KMT2A
SCHEMBL14781393 0.91 THRB (0.43) CYP4F2CYP4A11THRBMEN1KMT2A
SCHEMBL1072081 0.88 CES1 (0.48) THRBMEN1KMT2AHTTMAPT
SCHEMBL3785839 0.87 MEN1 (0.45) CYP4F2CYP4A11THRBMEN1KMT2A
SCHEMBL9547483 0.86 CES1 (0.52) THRBMEN1KMT2AHTTMAPT
SCHEMBL7092143 0.86 CES1 (0.52) THRBMEN1KMT2AHTTMAPT
SCHEMBL8110171 0.86 CES1 (0.52) THRBMEN1KMT2AHTTMAPT
SCHEMBL8110696 0.86 CES1 (0.52) THRBMEN1KMT2AHTTMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0679635-B1 Aromatic diazonium salts and their use in radiation-sensitive compositions AGFA GEVAERT NV (BE) 2000-09-27 EP disclosed
EP-0679635-A1 Aromatic diazonium salts and their use in radiation-sensitive compositions HOECHST AKTIENGESELLSCHAFT (DE) 1995-11-02 EP disclosed
EP-0285013-B1 Light-sensitive composition and copying material prepared therewith HOECHST AG (DE) 1993-12-22 EP disclosed
EP-0293656-B1 PROCESS FOR PRODUCING IMAGES ON PHOTOSENSITIVE MATERIAL HOECHST AKTIENGESELLSCHAFT (DE) 1992-11-25 EP disclosed
EP-0266654-B1 LIGHT SENSITIVE COMPOSITION, MATERIAL CONTAINING IT AND PROCESS FOR PRODUCING POSITIVE OR NEGATIVE RELIEF COPIES BY USING THIS MATERIAL HOECHST AKTIENGESELLSCHAFT (DE) 1992-11-25 EP disclosed
US-5149613-A Activating by exposure to ultraviolet light, hardening by heating, developing with aqueous alkaline developer material containing mixture of compound with bond split by acid and compound forming strong acid HOECHST AKTIENGESELLSCHAFT (DE) 1992-09-22 US disclosed
EP-0224161-B1 POSITIVE PHOTOSENSITIVE COMPOSITION HOECHST AKTIENGESELLSCHAFT (DE) 1992-06-03 EP disclosed
US-5084372-A PROCESS FOR PREPARING PHOTOGRAPHIC ELEMENTS UTILIZING LIGHT-SENSITIVE LAYER CONTAINING CYCLICAL ACID AMIDE THERMO-CROSSLINKING COMPOUND HOECHST CELANESE CORPORATION (US) 1992-01-28 US disclosed
EP-0184804-B1 PHOTOSENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREFROM AND PROCESS FOR THE PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-15 EP disclosed
US-5070001-A LIGHT-SENSITIVE MIXTURE FOR PRODUCING POSITIVE OR NEGATIVE RELIEF COPIES HOECHST AKTIENGESELLSCHAFT (DE) 1991-12-03 US disclosed
EP-0131780-A1 Light-sensitive composition and reproduction material prepared thereof HOECHST AKTIENGESELLSCHAFT (DE) 1985-01-23 EP disclosed
US-4457999-A Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light HOECHST AKTIENGESELLSCHAFT (DE) 1984-07-03 US disclosed
US-4458000-A Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light HOECHST AKTIENGESELLSCHAFT (DE) 1984-07-03 US disclosed
EP-0111273-A2 Light-sensitive composition, photoprinting material prepared using that composition and processes for producing a printing plate with this material HOECHST AKTIENGESELLSCHAFT (DE) 1984-06-20 EP disclosed
EP-0111274-A2 Photosensitive composition, photoprinting material prepared therewith and process for producing a printing plate with that material HOECHST AKTIENGESELLSCHAFT (DE) 1984-06-20 EP disclosed
US-4404272-A Light-sensitive mixture and copying material prepared therefrom with novolak having brominated phenol units HOECHST AKTIENGESELLSCHAFT (DE) 1983-09-13 US disclosed
US-4387152-A Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material HOECHST AKTIENGESELLSCHAFT (DE) 1983-06-07 US disclosed
EP-0078980-A1 Photosensitive composition and photosensitive copying material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1983-05-18 EP disclosed
EP-0059250-A1 Light-sensitive composition and copying material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1982-09-08 EP disclosed
EP-0050802-A2 Light-sensitive composition, light-sensitive copying material made therefrom, and process for producing a printing forme from this material HOECHST AKTIENGESELLSCHAFT (DE) 1982-05-05 EP disclosed