⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11744176 | 0.79 | CASP1 (0.33) | — | |
| SCHEMBL3517644 | 0.74 | MEN1 (0.32) | — | |
| SCHEMBL6897402 | 0.67 | TSHR (0.33) | — | |
| SCHEMBL4099364 | 0.65 | — | — | |
| SCHEMBL4352 | 0.52 | — | — | |
| SCHEMBL4252284 | 0.48 | — | — | |
| Ammonia Solution, Strong SCHEMBL4182902 | 0.48 | — | — | |
| Bromoform SCHEMBL18691 | 0.47 | — | — | |
| Bromoform SCHEMBL8874563 | 0.47 | — | — | |
| Bromoform SCHEMBL30241098 | 0.42 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 954 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | claimed |
| US-4359524-A | ANTIHALATION LAYER OF HALOGEN COMPOUND AND MEROCYANIN DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1982-11-16 | — | — | US | claimed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-12422750-B2 | Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| CN-116648313-B | Resin composition, cured product, laminate, method for producing cured product, and semiconductor device | 富士胶片株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119937247-A | Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2025-05-06 | — | — | CN | disclosed |
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-115190891-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-10-15 | — | — | CN | disclosed |
| CN-111566560-B | Photosensitive resin composition, partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2024-09-17 | — | — | CN | disclosed |
| CN-114981360-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-09-10 | — | — | CN | disclosed |
| US-4311782-A | POLYETHER OF ORTHOCARBOXYLIC ESTER | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-01-19 | — | — | US | disclosed |
| US-4259432-A | HIGH SENSITIVITY TO ULTRAVIOLET RADIATION AND ARGON LASER RAYS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-31 | — | — | US | disclosed |
| US-4258123-A | UNSATURATED COMPOUND, HALOGENATED TRIAZINE, UNSATURATED KETONE | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-24 | — | — | US | disclosed |
| US-4250247-A | COMPRISING AN ACID-FORMING COMPOUND AND A COMPOUND HAVING AS AN ACID-CLEAVABLE GROUP AN N-ACYLIMINOCARBONATE; RELIEF IMAGES; OFFSET PRINTING | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |
| US-4248957-A | ENOL ETHER CONTAINING COMPOUND OF WHICH THE SOLUBILITY IN DEVELOPER INCREASES ON CLEAVAGE | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-03 | — | — | US | disclosed |
| US-4247611-A | ACETAL RESIN, ACID DONER | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-27 | — | — | US | disclosed |
| EP-0006626-A2 | Radiation-sensitive mixture and process for producing relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |
| EP-0006627-A2 | Radiation-sensitive mixture and process for producing relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |
| US-4101323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |