SCHEMBL8097844

SCHEMBL8097844

CC(O)CN1C(=O)C=CC1=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 10/20 0.48
ALDH1A1 P00352 3/20 0.48
LMNA P02545 3/20 0.48
MAPT P10636 2/20 0.48
NPSR1 Q6W5P4 2/20 0.48
BLM P54132 2/20 0.48
GMNN O75496 1/20 0.48
THPO P40225 1/20 0.48
PMP22 Q01453 1/20 0.48
FAAH O00519 4/20 0.42
PTGS1 P23219 6/20 0.41
PTGS2 P35354 6/20 0.41
HPGD P15428 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
HSP90AA1 P07900 1/20 0.41
TLR9 Q9NR96 1/20 0.41
TP53 P04637 1/20 0.41
PKM P14618 1/20 0.41
XBP1 P17861 1/20 0.41
MAPK1 P28482 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17924922 0.83 MGLL (0.41) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL3864427 0.82 MGLL (0.44) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL17924835 0.82 MGLL (0.44) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL3864424 0.82 MGLL (0.44) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL17924880 0.82 MGLL (0.44) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL44138 0.80 MGLL (0.46) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL153302 0.80 MGLL (0.52) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL11927409 0.80 MGLL (0.46) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL709030 0.80 MGLL (0.46) MGLLALDH1A1LMNAMAPTNPSR1
SCHEMBL11128738 0.79 MGLL (0.52) MGLLALDH1A1LMNAMAPTNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6165672-A Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-12-26 US claimed
CN-115826360-B Photosensitive polyimide composition, method for producing pattern, cured product, and electronic component 江苏艾森半导体材料股份有限公司 2023-09-12 CN disclosed
CN-115826360-A Photosensitive polyimide composition, method for producing pattern, cured product, and electronic component 江苏艾森半导体材料股份有限公司 2023-03-21 CN disclosed
CN-110941142-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-05-25 CN disclosed
US-20210040268-A1 MODIFIED POLYSILOXANE AND APPLICATION THEREOF NANJING UNIVERSITY (CN) 2021-02-11 US disclosed
CN-110941142-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2020-03-31 CN disclosed
EP-2669342-B1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD KONICA MINOLTA INC (JP) 2020-03-18 EP disclosed
CN-106104381-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2019-12-13 CN disclosed
WO-2019169670-A1 MODIFIED POLYSILOXANE AND APPLICATION THEREOF 南京大学 2019-09-12 WO disclosed
US-9605143-B2 Resin composition for formation of optical waveguide, resin film for formation of optical waveguide which comprises the resin composition, and optical waveguide produced using the resin composition or the resin film HITACHI CHEMICALS COMPANY, LTD. (JP) 2017-03-28 US disclosed
US-9416289-B2 Active-energy-ray-curable inkjet ink composition, active-energy-ray-curable inkjet ink, and inkjet recording method Konica Minolta, Inc. (JP) 2016-08-16 US disclosed
US-20160209743-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MEMBER HAVING CURVED SHAPE, PHOTOSENSITIVE RESIN FILM FOR FORMING MEMBER HAVING CURVED SHAPE USING SAID COMPOSITION, AND LENS MEMBER MANUFACTRED USING SAID COMPOSITION OR SAID FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-07-21 US disclosed
US-20140130709-A1 PHOTOCURABLE INK JET INK KONICA MINOLTA , INC. (JP) 2014-05-15 US disclosed
EP-2722372-A1 PHOTOCURABLE INK JET INK Konica Minolta, Inc. (JP) 2014-04-23 EP disclosed
EP-2669342-A1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD Konica Minolta, Inc. (JP) 2013-12-04 EP disclosed
US-20130307913-A1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD Konica Minolta, Inc. (JP) 2013-11-21 US disclosed
US-20130223803-A1 RESIN COMPOSITION FOR FORMATION OF OPTICAL WAVEGUIDE, RESIN FILM FOR FORMATION OF OPTICAL WAVEGUIDE WHICH COMPRISES THE RESIN COMPOSITION, AND OPTICAL WAVEGUIDE PRODUCED USING THE RESIN COMPOSITION OR THE RESIN FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-08-29 US disclosed
CN-103069319-A Resin composition for formation of optical waveguide, resin film for formation of optical waveguide which comprises the resin composition, and optical waveguide produced using the resin composition or the resin film HITACHI CHEMICAL CO LTD 2013-04-24 CN disclosed
US-6165672-A Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-12-26 US disclosed