⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4956096 | 0.83 | CHRM2 (0.35) | — | |
| SCHEMBL2426751 | 0.82 | — | — | |
| SCHEMBL465330 | 0.81 | ALDH1A1 (0.35) | — | |
| SCHEMBL1006295 | 0.75 | CYP2D6 (0.32) | — | |
| SCHEMBL27500157 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL13859288 | 0.73 | CYP2D6 (0.30) | — | |
| SCHEMBL98702 | 0.73 | CA12 (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL28236851 | 0.73 | CYP2D6 (0.30) | — | |
| SCHEMBL5688639 | 0.73 | MAPT (0.40) | — | |
| SCHEMBL9935952 | 0.72 | GRM4 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109939977-A | Resin mask removes cleaning method | 花王株式会社 | 2019-06-28 | — | — | CN | claimed |
| CN-111566567-B | Cleaning agent composition for stripping resin mask | 花王株式会社 | 2024-07-12 | — | — | CN | disclosed |
| WO-2024147317-A1 | CLEANING COMPOSITION FOR METAL ARTICLES | 花王株式会社 | 2024-07-11 | — | — | WO | disclosed |
| EP-4209284-A1 | FLUX CLEANING AGENT COMPOSITION | Kao Corporation (JP) | 2023-07-12 | — | — | EP | disclosed |
| WO-2023080235-A1 | METHOD FOR MANUFACTURING PRINTED WIRING BOARD, METHOD FOR PEELING RESIST, AND RESIST PEELING PRETREATMENT LIQUID USED IN SAID METHODS | 三菱瓦斯化学株式会社 | 2023-05-11 | — | — | WO | disclosed |
| CN-116018397-A | Method for cleaning substrate | 花王株式会社 | 2023-04-25 | — | — | CN | disclosed |
| CN-114008539-A | Cleaning method | 花王株式会社 | 2022-02-01 | — | — | CN | disclosed |
| CN-112470079-A | Cleaning method | 花王株式会社 | 2021-03-09 | — | — | CN | disclosed |
| CN-108431194-B | Cleaning agent composition for soldering flux | 花王株式会社 | 2021-02-02 | — | — | CN | disclosed |
| US-10570355-B2 | Cleaning agent composition for glass hard disk substrate | KAO CORPORATION (JP) | 2020-02-25 | — | — | US | disclosed |
| CN-109939977-A | Resin mask removes cleaning method | 花王株式会社 | 2019-06-28 | — | — | CN | disclosed |
| CN-108431194-A | Scaling powder cleansing composition | 花王株式会社 | 2018-08-21 | — | — | CN | disclosed |
| US-20180163159-A1 | CLEANING AGENT COMPOSITION FOR GLASS HARD DISK SUBSTRATE | KAO CORPORATION (JP) | 2018-06-14 | — | — | US | disclosed |
| CN-107532115-A | CLEANING AGENT COMPOSITION FOR GLASS HARD DISK SUBSTRATE | 花王株式会社 | 2018-01-02 | — | — | CN | disclosed |
| US-6037444-A | COMPOUND OR POLYMER HAVING THIOL, HYDROXY, AMINO OR CARBOXYLIC GROUP IS REACTED WITH A COMPOUND COMPRISING AT LEAST TWO FUNCTIONAL GROUPS SELECTED FROM HYDROXYL, THIOL, AMINO AND CARBOXYLIC ACID GROUPS WHICH FUNCTIONAL GROUPS | COURTAULDS COATINGS (HOLDINGS) LIMITED (GB) | 2000-03-14 | — | — | US | disclosed |
| EP-0888279-A1 | SELECTIVE CHEMICAL REACTIONS AND POLYMERS OF CONTROLLED ARCHITECTURE PRODUCED THEREBY | COURTAULDS COATINGS (HOLDINGS) LIMITED (GB) | 1999-01-07 | — | — | EP | disclosed |
| WO-1997023443-A1 | SELECTIVE CHEMICAL REACTIONS AND POLYMERS OF CONTROLLED ARCHITECTURE PRODUCED THEREBY | COURTAULDS COATINGS (HOLDINGS) LIMITED (GB) | 1997-07-03 | — | — | WO | disclosed |