Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | CCNB2 | O95067 | 1/20 | 0.31 |
| ▸ | CCNE2 | O96020 | 1/20 | 0.31 |
| ▸ | CDK1 | P06493 | 1/20 | 0.31 |
| ▸ | CDK4 | P11802 | 1/20 | 0.31 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.31 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.31 |
| ▸ | CCND1 | P24385 | 1/20 | 0.31 |
| ▸ | CCNE1 | P24864 | 1/20 | 0.31 |
| ▸ | CDK2 | P24941 | 1/20 | 0.31 |
| ▸ | CCNA1 | P78396 | 1/20 | 0.31 |
| ▸ | CCNB3 | Q8WWL7 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1976536 | 0.94 | KDM4E (0.33) | KDM4ELMNAPKMCCNB2CCNE2 | |
| SCHEMBL9078603 | 0.89 | CCNB2 (0.31) | KDM4ECCNB2CCNE2CDK1CDK4 | |
| SCHEMBL9080867 | 0.87 | — | — | |
| SCHEMBL11785129 | 0.87 | KDM4E (0.33) | KDM4ECCNB2CCNE2CDK1CDK4 | |
| SCHEMBL6294613 | 0.82 | KDM4E (0.32) | KDM4ELMNAPKM | |
| SCHEMBL19750553 | 0.82 | — | — | |
| SCHEMBL5676401 | 0.80 | KDM4E (0.32) | KDM4ELMNAPKM | |
| SCHEMBL10712195 | 0.78 | HSD17B10 (0.36) | — | |
| SCHEMBL9080796 | 0.78 | KDM4E (0.33) | KDM4ELMNAPKM | |
| SCHEMBL15492875 | 0.78 | KDM4E (0.30) | KDM4ELMNAPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3555 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-119080989-A | Resin polymer, photosensitive resin composition and application thereof | 常州强力先端电子材料有限公司 | 2024-12-06 | — | — | CN | claimed |
| CN-118567184-B | Epoxy resin positive photoresist based on alkali deactivation mechanism and preparation method thereof | 潍坊星泰克微电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-118567184-A | Epoxy resin positive photoresist based on alkali deactivation mechanism and preparation method thereof | 潍坊星泰克微电子材料有限公司 | 2024-08-30 | — | — | CN | claimed |
| CN-118290657-A | Photocurable composition and application thereof | 常州强力先端电子材料有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-117567827-B | Environment-friendly degradable plastic and preparation method thereof | 正晟包装科技(广东)有限公司 | 2024-04-05 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-117567827-A | Environment-friendly degradable plastic and preparation method thereof | 正晟包装科技(广东)有限公司 | 2024-02-20 | — | — | CN | claimed |
| CN-116969953-A | Diphenyl pyrrolo-pyrrole-dione derivative, pigment composition and application thereof | 山东凯瑞尔光电科技有限公司 | 2023-10-31 | — | — | CN | claimed |
| EP-0285369-A2 | Coated abrasive binder containing ternary photoinitiator system | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-10-05 | — | — | EP | claimed |
| US-4735632-A | RAPID AND DEEP CURE OF BINDER OF MONOMER, ARYLIDONIUM SALT, SENSITIZER, AND ELECTRON DONOR | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-04-05 | — | — | US | claimed |
| US-4559401-A | Process for preparing chromophore-substituted vinyl-halomethyl-s-triazines | POLYCHROME CORPORATION (US) | 1985-12-17 | — | — | US | claimed |
| US-4528059-A | Anaerobically-cuting compositions | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1985-07-09 | — | — | US | claimed |
| US-4500608-A | ACRYLIC ESTER, HALOGEN INITIATOR, SECOND INITIATOR, AND POLYMERIZATION INHIBITOR | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-02-19 | — | — | US | claimed |
| US-4447588-A | ACRYLATE, HALOTRIAZINE OR HALOCARBONYL COMPOUND, FREE RADICAL POLYMERIZATION INHIBITOR | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1984-05-08 | — | — | US | claimed |
| US-4413108-A | HALOGEN COMPOUND AS FIRST INITIATOR, THIOL AS SECOND INITIATOR | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1983-11-01 | — | — | US | claimed |
| US-4404345-A | UNSATURATED CARBOXYL MONOMER, HALOGENATED PROMOTER, POLYMERIZATION INHIBITOR WITH REALTION PRODUCT OF ALDEHYDE AND AMINE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-09-13 | — | — | US | claimed |
| US-4359524-A | ANTIHALATION LAYER OF HALOGEN COMPOUND AND MEROCYANIN DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1982-11-16 | — | — | US | claimed |
| US-4239850-A | PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-16 | — | — | US | claimed |