SCHEMBL8101464

SCHEMBL8101464

CC(C)(C)C1(C(=O)OCCN2C(=O)C=CC2=O)CC2C=CC1C2.O=C(O)C1(CCO)CC2C=CC1C2.O=C(O)C1CC2C=CC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8101625 0.95
SCHEMBL8106173 0.86 PTGS1 (0.32)
Acetic Acid SCHEMBL8099722 0.81
Maleic Anhydride SCHEMBL5410505 0.79
SCHEMBL7872949 0.77 KDM4E (0.37)
SCHEMBL8100307 0.74
SCHEMBL8108186 0.73
SCHEMBL8104809 0.73 GSK3A (0.38)
SCHEMBL6403313 0.72 KDM4E (0.38)
SCHEMBL7073285 0.69 CYP2D6 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6165672-A Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-12-26 US claimed
US-6165672-A Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-12-26 US disclosed