SCHEMBL7872949

SCHEMBL7872949

O=C(O)C1(CCO)CC2C=CC1C2.O=C(O)C1CC2C=CC1C2

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
ALDH1A1 P00352 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL8099722 0.87
SCHEMBL710692 0.86 CYP2D6 (0.35)
SCHEMBL8613885 0.79 CYP2D6 (0.38)
SCHEMBL7696963 0.78 CYP2D6 (0.33)
Ethylene Glycol SCHEMBL15412415 0.77 KDM4E (0.53) KDM4ELMNAALDH1A1KMT2A
Ethylene Glycol SCHEMBL15412379 0.77 KDM4E (0.53) KDM4ELMNAALDH1A1KMT2A
SCHEMBL9317520 0.74 CYP2D6 (0.35)
SCHEMBL10388299 0.74 KDM4E (0.36) KDM4ELMNAALDH1A1
SCHEMBL5837166 0.74 CYP2D6 (0.33) LMNA
SCHEMBL24004713 0.73 KDM4E (0.61) KDM4ELMNAALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316162-B1 PHOTORESISTS PATTERNS AND MALEIC ANHYDRIDE-NORBORNENE ESTER COPOLYMERS AND PHOTOACID GENERATORS, COATINGS AND EXPOSURE, SPRAYING SILYLATION AND DRY ETCHING HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-11-13 US disclosed