SCHEMBL8102866

SCHEMBL8102866

CC(=O)N(C(C)=O)C(C)=O.[Ti]

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.42
TSHR P16473 2/20 0.39
THPO P40225 1/20 0.39
FFAR3 O14843 1/20 0.39
LCK P06239 1/20 0.39
FYN P06241 1/20 0.39
CA1 P00915 2/20 0.36
ALOX15 P16050 1/20 0.36
BLM P54132 1/20 0.36
PMP22 Q01453 1/20 0.36
ALDH1A1 P00352 4/20 0.31
TDP1 Q9NUW8 1/20 0.31
KDM4E B2RXH2 1/20 0.31
CA2 P00918 1/20 0.31
PTGS1 P23219 1/20 0.31
MMP12 P39900 1/20 0.31
CA4 P22748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL867771 0.95 LMNA (0.46) LMNATSHRTHPOFFAR3LCK
SCHEMBL28036623 0.91 LMNA (0.42) LMNATSHRTHPOFFAR3LCK
Ammonia Solution, Strong SCHEMBL5386563 0.91 LMNA (0.42) LMNATSHRTHPOFFAR3LCK
Water SCHEMBL31646391 0.91 LMNA (0.42) LMNATSHRTHPOFFAR3LCK
Hydrochloric Acid SCHEMBL362711 0.91 LMNA (0.42) LMNATSHRTHPOFFAR3LCK
SCHEMBL28225917 0.91 LMNA (0.42) LMNATSHRTHPOFFAR3LCK
Hydrochloric Acid SCHEMBL868414 0.91 LMNA (0.42) LMNATSHRTHPOFFAR3LCK
Ethylene SCHEMBL8444341 0.87 LMNA (0.39) LMNATSHRTHPOFFAR3LCK
Acetic Acid SCHEMBL634013 0.84 FFAR3 (0.54) LMNATSHRTHPOFFAR3LCK
Urea SCHEMBL27293669 0.84 LMNA (0.50) LMNATSHRTHPOFFAR3LCK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105793749-B Polarizing film, polarizing film with adhesive layer, and image display device 日东电工株式会社 2020-04-24 CN disclosed
US-6030630-A Cosmetic compositions for the hair or skin based on sulfone copolyesters with polyorganosiloxane units RHODIA CHIMIE (FR) 2000-02-29 US disclosed