Phosphoramidic Acid

Phosphoramidic Acid

SCHEMBL813235

CCCC.NP(=O)(O)O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117801459-B High-toughness flame-retardant aging-resistant antistatic ABS material and preparation method thereof 浙江东吴新材料股份有限公司 2024-08-02 CN claimed
US-12600100-B2 Polarizing plate, circularly polarizing plate, and method for producing polarizing plate FUJIFILM CORPORATION (JP) 2026-04-14 US disclosed
US-20260009940-A1 OPTICAL LAMINATE AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2026-01-08 US disclosed
US-20250368862-A1 OPTICAL LAMINATE AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2025-12-04 US disclosed
US-12466980-B2 Optical laminate and display device FUJIFILM CORPORATION (JP) 2025-11-11 US disclosed
US-12461296-B2 Optical laminate and image display device FUJIFILM CORPORATION (JP) 2025-11-04 US disclosed
CN-119744361-A Light-absorbing anisotropic film, method for producing light-absorbing anisotropic film, laminate, and image display device 富士胶片株式会社 2025-04-01 CN disclosed
CN-115244436-B Liquid crystal composition, light-absorbing anisotropic film, laminate, and image display device 富士胶片株式会社 2024-11-12 CN disclosed
US-12059884-B2 Optical laminate, organic el display device, and foldable device FUJIFILM CORPORATION (JP) 2024-08-13 US disclosed
CN-117801459-B High-toughness flame-retardant aging-resistant antistatic ABS material and preparation method thereof 浙江东吴新材料股份有限公司 2024-08-02 CN disclosed
EP-1765941-A4 BLACK INK COMPOSITION, INK SET CONTAINING THE SAME, AND INK JET RECORDING METHOD FUJIFILM CORP (JP) 2008-09-03 EP disclosed
US-20080043079-A1 Black Ink Composition, Ink Set Containing the Same, and Ink Jek Recording Method FUJIFILM CORPORATION (JP) 2008-02-21 US disclosed
US-20070252293-A1 METHOD FOR MANUFACTURING AN OPTICAL FILM HAVING A CONVEXOCONCAVE STRUCTURE, OPTICAL FILM, WIRE GRID POLARIZER AND RETARDATION FILM KONICA MINOLTA OPTO, INC. (JP) 2007-11-01 US disclosed
US-7211373-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2007-05-01 US disclosed
US-20070092663-A1 Cellulose ester film, polarizing plate and display KONICA MINOLTA OPTO, INC. 2007-04-26 US disclosed
EP-1765941-A1 BLACK INK COMPOSITION, INK SET CONTAINING THE SAME, AND INK JET RECORDING METHOD Fujifilm Corporation (JP) 2007-03-28 EP disclosed
US-20060210831-A1 Organic electroluminescent element FUJI PHOTO FILM CO., LTD 2006-09-21 US disclosed
WO-2006006726-A1 BLACK INK COMPOSITION, INK SET CONTAINING THE SAME, AND INK JET RECORDING METHOD FUJIFILM CORPORATION (JP) 2006-01-19 WO disclosed
US-20050158675-A9 Photothermographic material FUJIFILM CORPORATION (JP) 2005-07-21 US disclosed
US-20040023174-A1 Photothermographic material OHZEKI TOMOYUKI (JP) 2004-02-05 US disclosed