Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.37 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | LIPA | P38571 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98196 | 0.80 | — | — | |
| SCHEMBL22696659 | 0.77 | MAPT (0.34) | MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2 | |
| SCHEMBL5367258 | 0.73 | EPHX2 (0.30) | — | |
| SCHEMBL1767197 | 0.73 | CYP19A1 (0.30) | CYP19A1 | |
| SCHEMBL3362615 | 0.72 | HTT (0.35) | MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2 | |
| SCHEMBL4552150 | 0.72 | MAPT (0.39) | MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2 | |
| SCHEMBL6382164 | 0.72 | MAPT (0.39) | MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2 | |
| SCHEMBL22797 | 0.71 | — | — | |
| SCHEMBL5615220 | 0.71 | EPHX1 (0.42) | MAPTAPOBEC3AAPOBEC3GHTTSMN1; SMN2 | |
| SCHEMBL5270433 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4148791-A | DISPERSE DYES | SANDOZ LTD. (CH) | 1979-04-10 | — | — | US | claimed |
| WO-2024024615-A1 | PRIMER COMPOSITION AND COATED ARTICLE | 信越化学工業株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-20230288610-A1 | WAVELENGTH SELECTIVE ABSORPTION FILTER AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| CN-116568763-A | Wavelength selective absorption filter and display device | 富士胶片株式会社 | 2023-08-08 | — | — | CN | disclosed |
| US-9354356-B2 | Polymer film, and optically-compensatory film, polarizer and liquid-crystal display device comprising the same | FUJIFILM CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-9091804-B2 | Polymer film, and optically-compensatory film, polarizer and liquid-crystal display device comprising the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20130253182-A1 | POLYMER FILM, AND OPTICALLY-COMPENSATORY FILM, POLARIZER AND LIQUID-CRYSTAL DISPLAY DEVICE COMPRISING THE SAME | NISHIURA TAKAKO (JP) | 2013-09-26 | — | — | US | disclosed |
| US-8445081-B2 | Polarizing plate protective film, polarizing plate and liquid crystal display device | KONICA MINOLTA OPTO, INC. (JP) | 2013-05-21 | — | — | US | disclosed |
| US-8354148-B2 | Optical compensation polarizing plate, image display unit and liquid crystal display unit | FUJIFILM CORPORATION (JP) | 2013-01-15 | — | — | US | disclosed |
| US-8313814-B2 | Cellulose acylate film, method of producing the same, cellulose derivative film, optically compensatory film using the same, optically-compensatory film incorporating polarizing plate, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2012-11-20 | — | — | US | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |