SCHEMBL5367258

SCHEMBL5367258

COC1CCC(O[C]=O)CC1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL98196 0.86
SCHEMBL5355626 0.85
SCHEMBL1767197 0.79 CYP19A1 (0.30)
SCHEMBL18773606 0.76 EPHX2 (0.33) EPHX2
SCHEMBL4456910 0.76 EPHX2 (0.33) EPHX2
SCHEMBL9393516 0.76 EPHX2 (0.33) EPHX2
SCHEMBL29700 0.76
SCHEMBL5356302 0.75 ALDH1A1 (0.33)
SCHEMBL9237 0.75
SCHEMBL910706 0.74 EPHX2 (0.30) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed