Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.66 |
| ▸ | MAPT | P10636 | 8/20 | 0.61 |
| ▸ | NPC1 | O15118 | 6/20 | 0.61 |
| ▸ | RAB9A | P51151 | 6/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.61 |
| ▸ | HTT | P42858 | 3/20 | 0.61 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.61 |
| ▸ | NSD2 | O96028 | 2/20 | 0.60 |
| ▸ | LMNA | P02545 | 5/20 | 0.59 |
| ▸ | MEN1 | O00255 | 5/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.57 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.57 |
| ▸ | HPGD | P15428 | 1/20 | 0.55 |
| ▸ | MAOB | P27338 | 5/20 | 0.52 |
| ▸ | MAOA | P21397 | 4/20 | 0.52 |
| ▸ | MITF | O75030 | 1/20 | 0.51 |
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL814997 | 1.00 | CYP1A2 (0.66) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL24105852 | 1.00 | CYP1A2 (0.66) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL1349466 | 0.85 | CYP1A2 (0.64) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL1349468 | 0.85 | CYP1A2 (0.64) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL8999995 | 0.84 | CYP1A2 (0.62) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL8346191 | 0.84 | CYP1A2 (0.62) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL17069354 | 0.83 | CYP1A2 (0.60) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL2775363 | 0.83 | MAPT (0.56) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL10974383 | 0.83 | CYP1A2 (0.60) | CYP1A2MAPTNPC1RAB9AMAPK1 | |
| SCHEMBL10974381 | 0.83 | CYP1A2 (0.60) | CYP1A2MAPTNPC1RAB9AMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 199 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1780747-A2 | A conductive electrode powder, a method for preparing the same, and uses thereof | Samsung SDI Co., Ltd. (KR) | 2007-05-02 | — | — | EP | claimed |
| US-20070092987-A1 | Conductive electrode powder, a method for preparing the same, a method for preparing an electrode of a plasma display panel by using the same, and a plasma display panel comprising the same | SAMSUNG SDI CO., LTD. (KR) | 2007-04-26 | — | — | US | claimed |
| US-20050179355-A1 | Composition for forming an electron emission source for use in an electron emission device and an electron emission source prepared therefrom | SAMSUNG SDI CO., LTD. (KR) | 2005-08-18 | — | — | US | claimed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | claimed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | claimed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| EP-4361224-B1 | METHOD FOR PRODUCING A PRINTED MATTER | TORAY INDUSTRIES (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-3351602-B1 | LITHOGRAPHIC PRINTING INK, VARNISH FOR LITHOGRAPHIC INKS, AND METHOD FOR PRODUCING PRINTED MATTER USING SAID INK | TORAY INDUSTRIES (JP) | 2024-06-26 | — | — | EP | disclosed |
| CN-113825809-B | Printing ink, method for producing printed matter using same, and printed matter | 东丽株式会社 | 2024-05-31 | — | — | CN | disclosed |
| EP-4361224-A2 | METHOD FOR PRODUCING A PRINTED MATTER | Toray Industries, Inc. (JP) | 2024-05-01 | — | — | EP | disclosed |
| EP-3594006-B1 | METHOD FOR PRODUCING A PRINTED MATTER | TORAY INDUSTRIES (JP) | 2024-04-24 | — | — | EP | disclosed |
| EP-3594293-B1 | ACTINIC-RAY-CURABLE INK FOR LITHOGRAPHIC PRINTING AND METHOD FOR PRODUCING PRINTED MATTER USING SAME | TORAY INDUSTRIES (JP) | 2024-02-21 | — | — | EP | disclosed |
| CN-111954847-B | Photosensitive conductive paste and method for producing patterned green sheet using same | 东丽株式会社 | 2024-02-02 | — | — | CN | disclosed |
| EP-0203393-B1 | CURABLE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1989-07-12 | — | — | EP | disclosed |
| US-4778859-A | Tetramine derived polyimide with pendant unsaturation, and various photosensitive compositions therefrom | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1988-10-18 | — | — | US | disclosed |
| EP-0254230-A2 | Heat-resistant photoresist film | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1988-01-27 | — | — | EP | disclosed |
| EP-0203393-A1 | Curable composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-12-03 | — | — | EP | disclosed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | disclosed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | disclosed |