Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 9/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 6/20 | 0.56 |
| ▸ | NPC1 | O15118 | 4/20 | 0.56 |
| ▸ | RAB9A | P51151 | 4/20 | 0.56 |
| ▸ | HTT | P42858 | 3/20 | 0.56 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.50 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.50 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 10/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.48 |
| ▸ | LMNA | P02545 | 6/20 | 0.48 |
| ▸ | GSK3B | P49841 | 1/20 | 0.48 |
| ▸ | MITF | O75030 | 1/20 | 0.48 |
| ▸ | NSD2 | O96028 | 1/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.47 |
| ▸ | CRHBP | P24387 | 1/20 | 0.47 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL355427 | 1.00 | MAPT (0.56) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL27854449 | 0.90 | ALDH1A1 (0.49) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10977914 | 0.88 | MAPT (0.54) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10977916 | 0.88 | MAPT (0.54) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL1347928 | 0.87 | USP18 (0.54) | MAPTMAPK1NPC1RAB9AALDH1A1 | |
| SCHEMBL10979150 | 0.87 | ALDH1A1 (0.53) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL1347925 | 0.87 | USP18 (0.54) | MAPTMAPK1NPC1RAB9AALDH1A1 | |
| SCHEMBL10979146 | 0.87 | ALDH1A1 (0.53) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL9661326 | 0.84 | ALDH1A1 (0.46) | MAPTMAPK1NPC1RAB9AHTT | |
| SCHEMBL10985151 | 0.84 | ALDH1A1 (0.46) | MAPTMAPK1NPC1RAB9AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8399176-B2 | Photosensitive resin composition | LG CHEM, LTD. (KR) | 2013-03-19 | — | — | US | claimed |
| US-20100216073-A1 | PHOTOSENSITIVE RESIN COMPOSITION | LG CHEM, LTD. (KR) | 2010-08-26 | — | — | US | claimed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | claimed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| US-11640112-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20220011669-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-01-13 | — | — | US | disclosed |
| US-11174401-B2 | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby | LG CHEM, LTD. (KR) | 2021-11-16 | — | — | US | disclosed |
| US-10414926-B2 | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby | LG CHEM, LTD. (KR) | 2019-09-17 | — | — | US | disclosed |
| US-10414925-B2 | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby | LG CHEM, LTD. (KR) | 2019-09-17 | — | — | US | disclosed |
| US-10358565-B2 | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby | LG CHEM, LTD. (KR) | 2019-07-23 | — | — | US | disclosed |
| US-10259957-B2 | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby | LG CHEM, LTD. (KR) | 2019-04-16 | — | — | US | disclosed |
| US-10227498-B2 | UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby | LG CHEM, LTD. (KR) | 2019-03-12 | — | — | US | disclosed |
| US-5914354-A | POLYIMIDE PRECURSOR, TERTIARY AMINE, PHOTOPOLYMERIZATION INITIATOR, SENSITIZER; THICK FILMS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-06-22 | — | — | US | disclosed |
| US-5616448-A | Photosensitive resin composition and a process for forming a patterned polyimide film using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-01 | — | — | US | disclosed |
| EP-0580108-B1 | A photosensitive polyimide composition | ASAHI CHEMICAL IND (JP) | 1997-03-12 | — | — | EP | disclosed |
| US-5587275-A | POLYAMIC ACIDS COMPRISING DIAMINES WITH AN ACRYLOXY OR A METHACRYLOXY GROUP; STORAGE STABILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-12-24 | — | — | US | disclosed |
| EP-0718696-A2 | A photosensitive polyimide composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1996-06-26 | — | — | EP | disclosed |
| EP-0580108-A2 | A photosensitive polyimide composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1994-01-26 | — | — | EP | disclosed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | disclosed |