SCHEMBL815536

SCHEMBL815536

COP1OCC2(CO1)COP(OC)OC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12572810 0.90
SCHEMBL14294840 0.90
SCHEMBL13232829 0.88
SCHEMBL13043563 0.84
SCHEMBL24400109 0.72
SCHEMBL9008137 0.71
SCHEMBL22504856 0.69
SCHEMBL1108995 0.67
SCHEMBL11656621 0.67
SCHEMBL9008226 0.67 CA2 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 208 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4276195-A REPLACEMENT OF LIGAND IN TRANSITION METAL COMPLEX CATALYST WITH POLYDENTATE LIGAND IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 1981-06-30 US claimed
US-12012542-B2 Flame retardant rotomolded polyolefin BASF SE (DE) 2024-06-18 US disclosed
US-11767338-B2 3-phenyl-benzofuran-2-one diphosphate derivatives as stabilizers BASF SE (DE) 2023-09-26 US disclosed
US-20230241675-A1 COMPOSITIONS, COMPRISING PLATELET-SHAPED TRANSITION METAL PARTICLES BASF SE (DE) 2023-08-03 US disclosed
US-20230235121-A1 POLYAMIDE RESIN, POLYAMIDE RESIN COMPOSITION, AND MOLDED ARTICLE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-27 US disclosed
US-20230227608-A1 POLYAMIDE RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-20 US disclosed
US-20230227607-A1 POLYAMIDE RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-20 US disclosed
US-20230220160-A1 POLYAMIDE RESIN, POLYAMIDE RESIN COMPOSITION, AND MOLDED ARTICLE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-13 US disclosed
US-20230159727-A1 STERICALLY HINDERED AMINE STABILIZER MIXTURES BASF SE (DE) 2023-05-25 US disclosed
US-20230146472-A1 POLYOLEFIN COMPOSITIONS BASF SE (DE) 2023-05-11 US disclosed
US-4396735-A N-HETEROCYCLIC COMPOUND AND A HETEROCYCLIC ACID HYDRAZIDE ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1983-08-02 US disclosed
US-4381360-A 1,3-Dicarbonyl compounds and polyvinyl halide resin compositions containing the same PHOENIX CHEMICAL CORPORATION (US) 1983-04-26 US disclosed
US-4371651-A PHOTOSTABILITY, HEAT RESISTANCE PHOENIX CHEMICAL CORPORATION (US) 1983-02-01 US disclosed
US-4362831-A A HINDERED AND HETEROCYCLIC AMINE WITH A THIOALKANOIC ACID AMIDE ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1982-12-07 US disclosed
EP-0063180-A1 Beta-diketone and hydrotalcite stabilizer compositions for halogen-containing polymers and polymer compositions containing the same ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1982-10-27 EP disclosed
EP-0046161-A2 Stabilized Polyvinylhalide resin PHOENIX CHEMICAL CORPORATION (US) 1982-02-24 EP disclosed
US-4279805-A Alkylene-bis-thioalkanoic acid amide stabilizers for synthetic resins and synthetic resin compositions containing the same ARGUS CHEMICAL CORPORATION (US) 1981-07-21 US disclosed
US-4269731-A DISCOLORATION INHIBITION; MOLDING MATERIALS ARGUS CHEMICAL CORPORATION (US) 1981-05-26 US disclosed
US-4222931-A Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl ether alcohol or ether, phosphonic acid ester and phenolic antioxidant ARGUS CHEMICAL CORPORATION (US) 1980-09-16 US disclosed
US-4209431-A OXIDATION AND HEAT RESISTANCE WITCO CHEMICAL CORPORATION (US) 1980-06-24 US disclosed