⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithium SCHEMBL32669477 | 0.91 | — | — | |
| Water SCHEMBL31469844 | 0.91 | — | — | |
| SCHEMBL45345 | 0.89 | — | — | |
| SCHEMBL1116316 | 0.80 | — | — | |
| SCHEMBL544815 | 0.80 | — | — | |
| SCHEMBL10611491 | 0.80 | — | — | |
| SCHEMBL23878703 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL1415552 | 0.80 | — | — | |
| Charcoal, Activated SCHEMBL3115984 | 0.80 | — | — | |
| SCHEMBL20952051 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260022251-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2026-01-22 | — | — | US | claimed |
| US-20260015735-A1 | FORMULATION | MERCK ELECTRONICS KGAA (DE) | 2026-01-15 | — | — | US | claimed |
| CN-119852646-A | Composite film, battery and electric equipment | 重庆弗迪电池研究院有限公司 | 2025-04-18 | — | — | CN | claimed |
| WO-2025006246-A1 | INTERFACE TUNING FOR EROSION AND CORROSION RESISTANT COATINGS FOR SEMICONDUCTOR COMPONENTS | APPLIED MATERIALS, INC. (US) | 2025-01-02 | — | — | WO | claimed |
| US-20250003061-A1 | INTERFACE TUNING FOR EROSION AND CORROSION RESISTANT COATINGS FOR SEMICONDUCTOR COMPONENTS | APPLIED MATERIALS, INC. (US) | 2025-01-02 | — | — | US | claimed |
| WO-2024220286-A1 | COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTAINING MATERIALS | APPLIED MATERIALS, INC. (US) | 2024-10-24 | — | — | WO | claimed |
| US-20240347336-A1 | COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTAINING MATERIALS | APPLIED MATERIALS, INC. (US) | 2024-10-17 | — | — | US | claimed |
| WO-2024194393-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2024-09-26 | — | — | WO | claimed |
| WO-2024194394-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2024-09-26 | — | — | WO | claimed |
| CN-117943123-A | Composite gas-phase photocatalytic material of fluorine-regulated titanium dioxide/metal organic framework material and preparation method thereof | 重庆交通大学 | 2024-04-30 | — | — | CN | claimed |
| US-8158549-B2 | Catalysts for fluoroolefins hydrogenation | HONEYWELL INTERNATIONAL INC. (US) | 2012-04-17 | — | — | US | claimed |
| EP-2331724-A2 | OXYFLUORIDECOATING | Raytheon Company (US) | 2011-06-15 | — | — | EP | claimed |
| US-20110060172-A1 | CATALYSTS FOR FLUOROOLEFINS HYDROGENATION | HONEYWELL INTERNATIONAL INC. (US) | 2011-03-10 | — | — | US | claimed |
| WO-2011028415-A2 | CATALYSTS FOR FLUOROOLEFINS HYDROGENATION | HONEYWELL INTERNATIONAL INC. (US) | 2011-03-10 | — | — | WO | claimed |
| US-20100075172-A1 | PROCESS FOR PRODUCING A CORROSION-PROTECTED AND HIGH-GLOSS SUBSTRATE | ROPAL AG (CH) | 2010-03-25 | — | — | US | claimed |
| WO-2010016973-A2 | DURABLE ANTIREFLECTIVE MULTISPECTRAL INFRARED COATINGS | RAYTHEON COMPANY (US) | 2010-02-11 | — | — | WO | claimed |
| US-20100035036-A1 | Durable antireflective multispectral infrared coatings | RAYTHEON COMPANY | 2010-02-11 | — | — | US | claimed |
| CN-101370961-A | Method for producing a corrosion-resistant and high-gloss substrate | ROPAL AG (CH) | 2009-02-18 | — | — | CN | claimed |
| EP-1870489-B1 | Method to obtain a corrosion-resistant and shiny substrate | ROPAL AG (CH) | 2008-06-18 | — | — | EP | claimed |
| US-4058393-A | DISSOLVING, HYDROCHLORIC ACID | THE UNIVERSITY OF MELBOURNE (AU) | 1977-11-15 | — | — | US | claimed |