Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL6870529 | 0.91 | — | — | |
| SCHEMBL45345 | 0.89 | — | — | |
| SCHEMBL10611491 | 0.80 | — | — | |
| SCHEMBL1116316 | 0.80 | — | — | |
| SCHEMBL17699235 | 0.80 | — | — | |
| SCHEMBL23878703 | 0.80 | — | — | |
| SCHEMBL154001 | 0.80 | — | — | |
| Magnesium SCHEMBL224831 | 0.80 | — | — | |
| SCHEMBL20952051 | 0.80 | — | — | |
| Charcoal, Activated SCHEMBL3115984 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112751025-A | Positive active material, method of preparing the same, and rechargeable lithium battery including the same | 三星SDI株式会社 | 2021-05-04 | — | — | CN | disclosed |
| EP-1463132-B1 | Positive electrode active material for nonaqueous electrolyte secondary battery and nonaqueous electrolyte secondary battery | NICHIA CORP (JP) | 2019-08-21 | — | — | EP | disclosed |
| CN-104918700-A | ACTIVATION AND REGENERATION OF FLUORINATION CATALYSTS | ARKEMA INC | 2015-09-16 | — | — | CN | disclosed |
| EP-1391949-B1 | Positive electrode active material for a nonaqueous electrolyte secondary battery | NICHIA CORP (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-7851088-B2 | Positive electrode active material for nonaqueous electrolyte secondary battery and nonaqueous electrolyte secondary battery | NICHIA CORPORATION (JP) | 2010-12-14 | — | — | US | disclosed |
| US-7294435-B2 | Positive electrode active material for nonaqueous electrolyte secondary battery, positive electrode mixture for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery | NICHIA CORPORATION (JP) | 2007-11-13 | — | — | US | disclosed |
| EP-1368711-A4 | VACUUM ULTRAVIOLET TRANSMITTING SILICON OXYFLUORIDE LITHOGRAPHY GLASS | CORNING INC (US) | 2006-07-19 | — | — | EP | disclosed |
| US-20040229124-A1 | Positive electrode active material for nonaqueous electrolyte secondary battery, positive electrode mixture for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery | NICHIA CORPORATION (JP) | 2004-11-18 | — | — | US | disclosed |
| US-20040229123-A1 | Positive electrode active material for nonaqueous electrolyte secondary battery and nonaqueous electrolyte secondary battery | NICHIA CORPORATION (JP) | 2004-11-18 | — | — | US | disclosed |
| EP-1463132-A2 | Positive electrode active material for nonaqueous electrolyte secondary battery and nonaqueous electrolyte secondary battery | Nichia Corporation (JP) | 2004-09-29 | — | — | EP | disclosed |
| EP-1368711-A1 | VACUUM ULTRAVIOLET TRANSMITTING SILICON OXYFLUORIDE LITHOGRAPHY GLASS | CORNING INCORPORATED (US) | 2003-12-10 | — | — | EP | disclosed |
| US-6492072-B2 | PHOTOMASK SUBSTRATES; PHOTOLITHOGRAPHY | CORNING INCORPORATED | 2002-12-10 | — | — | US | disclosed |
| US-20020160276-A1 | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass | CORNING INCORPORATED | 2002-10-31 | — | — | US | disclosed |
| WO-2002069054-A1 | VACUUM ULTRAVIOLET TRANSMITTING SILICON OXYFLUORIDE LITHOGRAPHY GLASS | CORNING INCORPORATED (US) | 2002-09-06 | — | — | WO | disclosed |
| EP-1166183-A1 | VACUUM ULTRAVIOLET TRANSMITTING SILICON OXYFLUORIDE LITHOGRAPHY GLASS | CORNING INCORPORATED (US) | 2002-01-02 | — | — | EP | disclosed |
| US-20010014424-A1 | Vaccum ultraviolet transmitting silicon oxyfluoride lithography glass | MOORE LISA A (US) | 2001-08-16 | — | — | US | disclosed |
| US-6242136-B1 | PHOTOMASK SUBSTRATE | CORNING INCORPORATED | 2001-06-05 | — | — | US | disclosed |
| CN-1291173-A | Antimony oxide glass with optical activity | CORNING INC (US) | 2001-04-11 | — | — | CN | disclosed |
| CN-1280551-A | Rare earth halide environment in oxyhalide glasses | CORNING INC (US) | 2001-01-17 | — | — | CN | disclosed |
| WO-2000048046-A1 | VACUUM ULTRAVIOLET TRANSMITTING SILICON OXYFLUORIDE LITHOGRAPHY GLASS | CORNING INCORPORATED (US) | 2000-08-17 | — | — | WO | disclosed |