SCHEMBL8166454

SCHEMBL8166454

CO[Si](CCC1CC2CC(C1)O2)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8001617 0.84 LMNA (0.33)
SCHEMBL28749961 0.83
SCHEMBL9098574 0.78 LMNA (0.31)
SCHEMBL21316656 0.76 PTGS1 (0.32)
SCHEMBL7954394 0.75 LMNA (0.33)
SCHEMBL10344526 0.75
SCHEMBL21316657 0.74 PTGS1 (0.31)
SCHEMBL20090280 0.74 PTGS1 (0.31)
SCHEMBL17783727 0.74 LMNA (0.31)
SCHEMBL16020793 0.73 PTGS1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6147157-A DIORGANOPOLYSILOXANE OPTIONALLY TERMINATED ALKOXY GROUPS; AN ORGANOTRIALKOXY SILANE COMPOUND; AN ORGANOALKOXY SILANE CONTAINING AMIDO AND CARBOXYL GROUPS; AN ORGANOALKOXYSILANE WITH EPOXY GROUP; AND CURING CATALYST; FOR LUBRICATING RUBBER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-11-14 US claimed
WO-2020208884-A1 FILM-FORMING COMPOSITION, CURED FILM, AND RETARDATION FILM JSR株式会社 2020-10-15 WO disclosed
US-10385470-B2 Treatment of an anodically oxidized surface NANOGATE AG (DE) 2019-08-20 US disclosed
US-8916476-B2 Microfine structure formation method and microfine structure formed body HITACHI-LG DATA STORAGE, INC. (JP) 2014-12-23 US disclosed
US-20140231965-A1 MICROFINE STRUCTURE FORMATION METHOD AND MICROFINE STRUCTURE FORMED BODY HITACHI MEDIA ELECTRONICS CO., LTD. (JP) 2014-08-21 US disclosed