Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.31 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4536047 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4525929 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4530966 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4538868 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4530573 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4516780 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4524633 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4533168 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4526300 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 | |
| SCHEMBL4530186 | 0.98 | LMNA (0.42) | SMN1; SMN2ALDH1A1LMNAHSD17B10MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-117457987-B | Electrolyte additive, preparation method thereof and battery | 广东聚圣科技有限公司 | 2024-06-21 | — | — | CN | claimed |
| CN-117457987-A | Electrolyte additive, preparation method thereof and battery | 广东聚圣科技有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-116149140-B | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-A | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-23 | — | — | CN | claimed |
| US-20250362601-A1 | Photosensitive Resin Composition, Method Of Manufacturing Pattern Cured Film, Cured Film, Interlayer Insulating Film, Cover Coat Layer, Surface Protective Film, And Electronic Component | HD MICROSYSTEMS LTD (JP) | 2025-11-27 | — | — | US | disclosed |
| US-12386257-B2 | Photosensitive resin composition, method of manufacturing pattern cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2025-08-12 | — | — | US | disclosed |
| US-12386256-B2 | Photosensitive resin composition, method for producing patterned cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2025-08-12 | — | — | US | disclosed |
| CN-113168101-B | Photosensitive resin composition, method for producing pattern cured film, interlayer insulating film, coverlay, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2025-02-18 | — | — | CN | disclosed |
| US-20250051584-A1 | COATING PREVENTING ICE ACCUMULATION ON SURFACES | BASF COATINGS GMBH (DE) | 2025-02-13 | — | — | US | disclosed |
| CN-113168102-B | Photosensitive resin composition, method for producing pattern cured product, interlayer insulating film, coverlay, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2024-11-19 | — | — | CN | disclosed |
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | disclosed |
| EP-2091988-A1 | COATING AGENTS HAVING HIGH SCRATCH RESISTANCE AND WEATHERING STABILITY | BASF Coatings AG (DE) | 2009-08-26 | — | — | EP | disclosed |
| EP-2091987-A1 | COATING AGENTS HAVING HIGH SCRATCH RESISTANCE AND WEATHERING STABILITY | BASF Coatings AG (DE) | 2009-08-26 | — | — | EP | disclosed |
| WO-2009077182-A1 | COATING COMPOSITION HAVING A HIGH SCRATCH RESISTANCE AND WEATHERING STABILITY | BASF COATINGS AG (DE) | 2009-06-25 | — | — | WO | disclosed |
| WO-2009077181-A1 | COATING AGENT HAVING HIGH SCRATCH RESISTANCE AND HIGH WEATHERING RESISTANCE | BASF COATINGS AG (DE) | 2009-06-25 | — | — | WO | disclosed |
| WO-2009077180-A1 | COATING AGENT WITH HIGH SCRATCH RESISTANCE AND WEATHERING RESISTANCE | BASF COATINGS AG (DE) | 2009-06-25 | — | — | WO | disclosed |
| WO-2008074491-A1 | COATING AGENTS HAVING HIGH SCRATCH RESISTANCE AND WEATHERING STABILITY | BASF COATINGS AG (DE) | 2008-06-26 | — | — | WO | disclosed |
| WO-2008074490-A1 | COATING AGENTS HAVING HIGH SCRATCH RESISTANCE AND WEATHERING STABILITY | BASF COATINGS AG (DE) | 2008-06-26 | — | — | WO | disclosed |
| WO-2008074489-A1 | COATING AGENTS HAVING HIGH SCRATCH RESISTANCE AND WEATHERING STABILITY | BASF COATINGS AG (DE) | 2008-06-26 | — | — | WO | disclosed |