SCHEMBL818393

SCHEMBL818393

CCCCCCCCCCCCCCCCC(C(=O)O)C1CC(C)(C)N(C)C(C)(C)C1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.41
FFAR1 O14842 2/20 0.41
MAPT P10636 1/20 0.40
LCK P06239 1/20 0.40
PPARD Q03181 1/20 0.40
ZDHHC20 Q5W0Z9 1/20 0.40
ZDHHC2 Q9UIJ5 1/20 0.40
FFAR4 Q5NUL3 1/20 0.38
ACE2 Q9BYF1 1/20 0.38
GRIK1 P39086 1/20 0.36
GRIK2 Q13002 1/20 0.36
EPHX2 P34913 1/20 0.35
TSHR P16473 1/20 0.35
NFKB1 P19838 1/20 0.35
CYP2C19 P33261 1/20 0.35
FAAH O00519 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15299924 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL15299921 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL15299881 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL10423803 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL15300097 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL15299834 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL9655168 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL15707712 1.00 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD
SCHEMBL11176368 0.89 GPR84 (0.39) GPR84FFAR1MAPTLCKPPARD
SCHEMBL755538 0.88 GPR84 (0.41) GPR84FFAR1MAPTLCKPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3786216-B1 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING CYTEC TECH CORP (US) 2026-02-11 EP claimed
EP-3137540-B1 STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION CYTEC IND INC (US) 2024-10-30 EP claimed
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
EP-2864310-B1 STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE CYTEC TECH CORP (US) 2022-10-26 EP claimed
EP-2652014-B1 PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING CYTEC TECH CORP (US) 2020-07-01 EP claimed
EP-3154937-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM Fina Technology, Inc. (US) 2017-04-19 EP claimed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US claimed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO claimed
US-20130267633-A1 Stabilized Polyolefins Having Increased Agrochemical and UV Resistance and Methods of Use CYTEC TECHNOLOGY CORP. (US) 2013-10-10 US claimed
EP-2647664-A1 Method for stabilizing polyolefin films against UV degradation CYTEC TECHNOLOGY CORP. (US) 2013-10-09 EP claimed
EP-0814127-B1 Embrittlement-resistant polyolefin composition and flexible articles therefrom MONTELL NORTH AMERICA INC (US) 2001-08-16 EP claimed
US-4957953-A MONO-AND POLYTETRAMETHYLPIPERIDINE ESTERS ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1990-09-18 US claimed
EP-4745198-A1 RESIN COMPOSITION, MOLDED ARTICLE, RESIN ADDITIVE COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, METHOD FOR IMPROVING CRYSTALLINITY OF CRYSTALLINE RESIN, AND MATERIAL FOR RESIN ADDITIVE COMPOSITION ADEKA CORPORATION (JP) 2026-05-20 EP disclosed
EP-4729581-A1 PLASTICIZER, COMPOSITION, AND MOLDED ARTICLE ADEKA CORPORATION (JP) 2026-04-22 EP disclosed
EP-4678699-A1 RESIN ADDITIVE, COMPOSITION, MOLDED ARTICLE AND COMPOUND ADEKA CORPORATION (JP) 2026-01-14 EP disclosed
US-20250263524-A1 Method for Polycondensation of a Recycled Polyester SI GROUP, INC. 2025-08-21 US disclosed
EP-0336606-A1 Composition of stabilized synthetic resin ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1989-10-11 EP disclosed
EP-0300161-A2 Stabilizer system HÜLS AKTIENGESELLSCHAFT (DE) 1989-01-25 EP disclosed
EP-0226453-A2 Polyolefin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-06-24 EP disclosed
US-4467061-A POLYOLEFIN BLENDS WITH BENZOTRIAZOLE COMPOUND, HINDERED AMINE, PHENYL BENZOATE OR NICKEL COMPLEX TONEN SEKIYU KAGAKU KABUSHIKI KAISHA (JP) 1984-08-21 US disclosed