SCHEMBL818455

SCHEMBL818455

O=P(O)(F)Oc1ccccc1.O=P(O)(F)Oc1ccccc1.O=P(O)(F)Oc1ccccc1.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F

nearest known ligand 0.64

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.64
L3MBTL1 Q9Y468 2/20 0.50
TDP1 Q9NUW8 1/20 0.50
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
KDM4E B2RXH2 1/20 0.45
ANPEP P15144 2/20 0.44
LAP3 P28838 2/20 0.44
HPGD P15428 1/20 0.44
POLB P06746 1/20 0.44
MEN1 O00255 1/20 0.41
HTT P42858 1/20 0.41
KMT2A Q03164 1/20 0.41
CA2 P00918 1/20 0.41
CA4 P22748 1/20 0.41
CA5A P35218 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15474483 1.00 SRC (0.64) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL28781038 0.98 SRC (0.67) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL4815664 0.92 SRC (0.55) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL10813125 0.92 SRC (0.55) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL4868363 0.86 SRC (0.53) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL10356538 0.85 SRC (0.48) SRCCYP2C19HPGDMEN1KMT2A
SCHEMBL4272051 0.78 SRC (0.73) SRCL3MBTL1TDP1CYP2C9CYP2C19
Phenyl Dihydrogen Phosphate SCHEMBL20263 0.78 SRC (1.00) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL6686008 0.78 SRC (0.73) SRCL3MBTL1TDP1CYP2C9CYP2C19
Benzene SCHEMBL11142811 0.78 SRC (0.73) SRCL3MBTL1TDP1CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3357990-B1 ADHESIVE SEKISUI CHEMICAL CO LTD (JP) 2020-03-04 EP disclosed
US-20180273813-A1 ADHESIVE SEKISUI CHEMICAL CO., LTD. (JP) 2018-09-27 US disclosed
EP-3357990-A1 ADHESIVE Sekisui Chemical Co., Ltd. (JP) 2018-08-08 EP disclosed
CN-104428135-B Film laminate with self-assembled film 日本曹达株式会社 2016-11-16 CN disclosed
US-8741167-B1 Etching composition and its use in a method of making a photovoltaic cell E I DU PONT DE NEMOURS AND COMPANY (US) 2014-06-03 US disclosed
US-20140137937-A1 ETCHING COMPOSITION AND ITS USE IN A METHOD OF MAKING A PHOTOVOLTAIC CELL E I DU PONT DE NEMOURS AND COMPANY (US) 2014-05-22 US disclosed
CN-102933690-A Etching composition and use thereof in a method for producing a photovoltaic cell DU PONT 2013-02-13 CN disclosed
US-20110308614-A1 ETCHING COMPOSITION AND ITS USE IN A METHOD OF MAKING A PHOTOVOLTAIC CELL E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-12-22 US disclosed
US-20110278507-A1 THICK FILM SILVER PASTES CONTAINING IODONIUM AND/OR SULFONIUM SALTS AND THEIR USE IN PHOTOVOLTAIC CELLS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-11-17 US disclosed
US-7759451-B2 Fumaric diester copolymer TOSOH CORPORATION (JP) 2010-07-20 US disclosed
CN-101115682-A Dispersion of titanium oxide particles, titanium oxide thin film, solution for forming organic functional film, substrate having organic functional film formed thereon and method for producing same NIPPON SODA CO (JP) 2008-01-30 CN disclosed
US-20070298247-A1 Fumaric diester copolymer TOSOH CORPORATION (JP) 2007-12-27 US disclosed
US-6054501-A CURABILITY; GLOSSINESS; CAN BE BLENDED WITH INKS, PAINTS NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2000-04-25 US disclosed
CN-1195356-A Photopolymerization initiator and energy ray-curable composition containing the same NIPPON KAYAKU KK (JP) 1998-10-07 CN disclosed
EP-0844255-A1 PHOTOPOLYMERIZATION INITIATOR AND ACTINIC RADIATION-CURABLE COMPOSITION COMPRISING THE SAME NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1998-05-27 EP disclosed