SCHEMBL4815664

SCHEMBL4815664

O=P(O)(F)OI.O=P(O)(F)Oc1ccccc1.O=P(O)(F)Oc1ccccc1.O=P(O)(O)F.O=P(O)(O)F.O=P(O)(O)F

nearest known ligand 0.55

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.55
L3MBTL1 Q9Y468 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
ANPEP P15144 2/20 0.40
LAP3 P28838 2/20 0.40
HPGD P15428 1/20 0.40
KDM4E B2RXH2 1/20 0.40
POLB P06746 1/20 0.40
MEN1 O00255 1/20 0.37
HTT P42858 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15474483 0.92 SRC (0.64) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL818455 0.92 SRC (0.64) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL28781038 0.90 SRC (0.67) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL10813125 0.85 SRC (0.55) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL4868363 0.79 SRC (0.53) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL10356538 0.79 SRC (0.48) SRCCYP2C19HPGDMEN1KMT2A
SCHEMBL27369515 0.78 SRC (0.61) SRCL3MBTL1TDP1CYP2C9CYP2C19
SCHEMBL6934990 0.73 SRC (0.54) SRCL3MBTL1TDP1KDM4EMEN1
SCHEMBL14880661 0.73 SRC (0.54) SRCL3MBTL1TDP1KDM4EMEN1
SCHEMBL6686008 0.72 SRC (0.73) SRCL3MBTL1TDP1CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7407733-B2 Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2008-08-05 US disclosed
US-20060281022-A1 Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-12-14 US disclosed
US-20060160247-A1 Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-07-20 US disclosed
EP-1681307-A1 POLYMERIC COMPOUND CONTAINING REPEATING UNIT HAVING 2-OXATRICYCLO[4.2.1.04,8]NONAN-3-ONE RING, AND PHOTORESIST RESIN COMPOSITION Daicel Chemical Industries, Ltd. (JP) 2006-07-19 EP disclosed
US-20060058480-A1 Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-03-16 US disclosed
US-20050282985-A1 FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2005-12-22 US disclosed
US-20050245706-A1 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2005-11-03 US disclosed
US-20050142487-A1 Polymerizable adamantane derivative, production process thereof and polymeric compound DAICEL CHEMICAL INDUSTRIES, LTD. 2005-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060160247-A1 Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition HCAR1, HCAR2, RARA SRC 1258/4885L3MBTL1 1377/4885TDP1 3391/4885
US-20050282985-A1 FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION AFF1, AFF2, FPR1 SRC 2505/4885L3MBTL1 608/4885TDP1 3880/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.