SCHEMBL819602

SCHEMBL819602

CC(=O)/C(C)=C(/C)C(=O)O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.43
THPO P40225 1/20 0.43
FFAR3 O14843 1/20 0.43
LCK P06239 1/20 0.43
FYN P06241 1/20 0.43
LMNA P02545 2/20 0.36
CA4 P22748 2/20 0.35
THRB P10828 2/20 0.33
FNTA P49354 1/20 0.33
FNTB P49356 1/20 0.33
PGGT1B P53609 1/20 0.33
BLM P54132 2/20 0.31
PMP22 Q01453 2/20 0.31
CA1 P00915 1/20 0.31
ALOX15 P16050 1/20 0.31
NPSR1 Q6W5P4 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4119300 1.00 TSHR (0.43) TSHRTHPOFFAR3LCKFYN
SCHEMBL9871980 1.00 TSHR (0.43) TSHRTHPOFFAR3LCKFYN
Methane SCHEMBL15247107 0.96 TSHR (0.40) TSHRTHPOFFAR3LCKFYN
SCHEMBL105999 0.88 FFAR3 (0.55) TSHRTHPOFFAR3LCKFYN
SCHEMBL141678 0.88 FFAR3 (0.55) TSHRTHPOFFAR3LCKFYN
SCHEMBL10661655 0.88 FFAR3 (0.55) TSHRTHPOFFAR3LCKFYN
SCHEMBL10661623 0.88 FFAR3 (0.55) TSHRTHPOFFAR3LCKFYN
SCHEMBL105998 0.88 FFAR3 (0.55) TSHRTHPOFFAR3LCKFYN
SCHEMBL11662990 0.84 FFAR3 (0.50) TSHRTHPOFFAR3LCKFYN
SCHEMBL11662989 0.84 FFAR3 (0.50) TSHRTHPOFFAR3LCKFYN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170168041-A1 Polymers And Oligomers With Aggregation-Induced Emission Characteristics For Imaging And Image-Guided Therapy NATIONAL UNIVERSITY OF SINGAPORE (SG) 2017-06-15 US disclosed
US-8318401-B2 Positive typed photosensitive composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-11-27 US disclosed
US-8318401-B2 Positive typed photosensitive composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-11-27 US disclosed
US-20110183115-A1 POSITIVE TYPED PHOTOSENSITIVE COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2011-07-28 US disclosed
US-20110183115-A1 POSITIVE TYPED PHOTOSENSITIVE COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2011-07-28 US disclosed
EP-2292695-A1 Positive type photosensitive composition Korea Kumho Petrochemical Co. Ltd. (KR) 2011-03-09 EP disclosed
US-20110053081-A1 Positive Type Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053081-A1 Positive Type Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053080-A1 Positive Typed Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053080-A1 Positive Typed Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
EP-2290005-A1 Positive type photosensitive composition Korea Kumho Petrochemical Co. Ltd. (KR) 2011-03-02 EP disclosed
US-7838468-B2 High molecular weight polyamine salts as clay stabilizing agents BAKER HUGHES INCORPORATED (US) 2010-11-23 US disclosed
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US disclosed
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US disclosed
EP-1906246-A2 Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device FUJIFILM Corporation (JP) 2008-04-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170168041-A1 Polymers And Oligomers With Aggregation-Induced Emission Characteristics For Imaging And Image-Guided Therapy MAPT, FUS, CLTB TSHR 4113/4885THPO 1218/4885FFAR3 3447/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.