⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL585661 | 0.58 | — | — | |
| SCHEMBL10793630 | 0.43 | — | — | |
| SCHEMBL6272478 | 0.41 | — | — | |
| SCHEMBL2398119 | 0.41 | — | — | |
| SCHEMBL1324483 | 0.35 | — | — | |
| SCHEMBL14405761 | 0.35 | — | — | |
| SCHEMBL890278 | 0.35 | — | — | |
| SCHEMBL1465460 | 0.30 | — | — | |
| SCHEMBL12992748 | 0.26 | — | — | |
| Methane SCHEMBL23044967 | 0.20 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117164606-A | Di-pyrrole-dione pigment and preparation method and application thereof | 海昌隐形眼镜有限公司 | 2023-12-05 | — | — | CN | claimed |
| CN-114383514-B | CMOS contact displacement sensor and measuring method | 广州市合熠智能科技股份有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114383514-A | CMOS contact displacement sensor and measuring method | 广州市合熠智能科技股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| EP-1645604-B1 | Dissimilar pigments for use in dark and light inkjet inks | HEWLETT PACKARD DEVELOPMENT CO (US) | 2014-08-06 | — | — | EP | claimed |
| US-8512921-B2 | Pigment dispersion composition, color resist composition including the same, and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2013-08-20 | — | — | US | claimed |
| US-8497053-B2 | Pigment dispersion composition, resist composition for color filter including the same, and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2013-07-30 | — | — | US | claimed |
| US-20130085256-A1 | FUSED THIOPHENES, METHODS OF MAKING FUSED THIOPHENES, AND USES THEREOF | CORNING INCORPORATED | 2013-04-04 | — | — | US | claimed |
| US-20110200921-A1 | Pigment Dispersion Composition, Color Resist Composition Including the Same, and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2011-08-18 | — | — | US | claimed |
| US-20100167188-A1 | Pigment Dispersion Composition, Resist Composition for Color Filter Including the Same, and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2010-07-01 | — | — | US | claimed |
| WO-2010050650-A1 | PIGMENT DISPERSION COMPOSITION AND COLOR RESIST COMPOSITION INCLUDING THE SAME AND COLOR FILTER USING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2010-05-06 | — | — | WO | claimed |
| US-7591889-B2 | Dissimilar pigments for use in dark and light inkjet inks | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2009-09-22 | — | — | US | claimed |
| WO-2009035189-A1 | PIGMENT DISPERSION COMPOSITION, RESIST COMPOSITION FOR COLOR FILTER INCLUDING THE SAME, AND COLOR FILTER USING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2009-03-19 | — | — | WO | claimed |
| US-20060075925-A1 | Dissimilar pigments for use in dark and light inkjet inks | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. | 2006-04-13 | — | — | US | claimed |
| EP-1645604-A2 | Dissimilar pigments for use in dark and light inkjet inks | Hewlett-Packard Development Company, L.P. (US) | 2006-04-12 | — | — | EP | claimed |
| EP-0882772-B1 | Pigment compositions | CIBA SC HOLDING AG (CH) | 2003-06-25 | — | — | EP | claimed |
| US-6096801-A | Pigment compositions | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2000-08-01 | — | — | US | claimed |
| EP-0882772-A1 | Pigment compositions | Ciba SC Holding AG (CH) | 1998-12-09 | — | — | EP | claimed |
| CN-121888790-A | Perovskite photovoltaic device resistant to extreme temperature impact and used for space and preparation method thereof | 深圳翊阳科技有限公司 | 2026-04-17 | — | — | CN | disclosed |
| US-5382485-A | Process for storing information | CIBA-GEIGY CORPORATION (US) | 1995-01-17 | — | — | US | disclosed |
| EP-0560727-A1 | Information storage method | CIBA-GEIGY AG (CH) | 1993-09-15 | — | — | EP | disclosed |