SCHEMBL8199908

SCHEMBL8199908

C=C(C)C(=O)OCC1COC2(CCCCC2)O1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
PABPC1 P11940 1/20 0.43
CTDSP1 Q9GZU7 1/20 0.43
GAA P10253 1/20 0.40
HTR1A P08908 4/20 0.36
ADRA1D P25100 3/20 0.36
ADRA1B P35368 3/20 0.36
ADRA1A P35348 2/20 0.36
CYP3A4 P08684 2/20 0.35
TSHR P16473 2/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
TMEM97 Q5BJF2 1/20 0.34
SIGMAR1 Q99720 1/20 0.34
BRD4 O60885 1/20 0.34
ABL1 P00519 1/20 0.34
LMNA P02545 1/20 0.34
RAB9A P51151 1/20 0.34
RIN1 Q13671 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8201396 1.00 ALDH1A1 (0.58) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL8199603 1.00 ALDH1A1 (0.58) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL8200512 0.99 ALDH1A1 (0.59) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL14065602 0.93 ALDH1A1 (0.63) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL16843425 0.87 ALDH1A1 (0.47) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL16840276 0.87 ALDH1A1 (0.47) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL14065599 0.87 ALDH1A1 (0.59) ALDH1A1PABPC1CTDSP1CYP3A4TSHR
SCHEMBL24204860 0.86 ALDH1A1 (0.43) ALDH1A1PABPC1CTDSP1GAAHTR1A
SCHEMBL14065601 0.83 ALDH1A1 (0.58) ALDH1A1CYP3A4TSHRCYP2D6CYP2C19
SCHEMBL14065605 0.83 ALDH1A1 (0.51) ALDH1A1CYP3A4TSHRCYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230347663-A1 Methods For Printing And Wrapping SEIKO EPSON CORPORATION (JP) 2023-11-02 US disclosed
US-20230174809-A1 Radiation-Curable Ink Jet Composition And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2023-06-08 US disclosed
US-20230167314-A1 Radiation-Curable Ink Jet Ink Composition And Ink Jet Printing Method SEIKO EPSON CORPORATION (JP) 2023-06-01 US disclosed
US-10564544-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-02-18 US disclosed
US-20170329223-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed
US-20170329223-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed
US-8916053-B2 Pattern forming method KABUSHIKI KAISHA TOSHIBA (JP) 2014-12-23 US disclosed
US-20130075361-A1 PATTERN FORMING METHOD KABUSHIKI KAISHA TOSHIBA (JP) 2013-03-28 US disclosed
US-20090027608-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIN TRANSFER FILM, AND METHOD FOR PRODUCING A PHOTOSPACER, AND SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2009-01-29 US disclosed
US-6146811-A Photoresist using dioxaspiro ring-substituted acryl derivatives KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2000-11-14 US disclosed