SCHEMBL822245

SCHEMBL822245

C=C(O)CC(=C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1809603 0.86 ALOX15 (0.57)
Itaconate SCHEMBL21523 0.80
Itaconate SCHEMBL286967 0.80 ALOX15 (0.75)
Itaconate SCHEMBL29886131 0.80
Itaconate SCHEMBL18554417 0.78 ALOX15 (0.71)
Itaconate SCHEMBL6552810 0.78 ALOX15 (0.71)
Itaconate SCHEMBL9244093 0.78 ALOX15 (0.71)
Itaconate SCHEMBL2397428 0.78 ALOX15 (0.71)
Itaconate SCHEMBL7518254 0.78 ALOX15 (0.71)
Itaconate SCHEMBL10757202 0.78 ALOX15 (0.71)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2970115-B1 ALLOPHANATE POLYACRYLATE VENCOREX FRANCE (FR) 2018-06-27 EP claimed
EP-2970115-A1 ALLOPHANATE POLYACRYLATE Vencorex France (FR) 2016-01-20 EP claimed
WO-2014140238-A1 ALLOPHANATE POLYACRYLATE VENCOREX FRANCE (FR) 2014-09-18 WO claimed
US-6458907-B1 ORGANOMETALLIC POLYMERIZABLE MONOMER ACID OR ESTER ARE USEFUL AS RESISTS AND ARE SENSITIVE TO IMAGING IRRADIATION WHILE EXHIBITING ENHANCED RESISTANCE TO REACTIVE ION ETCHING. INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-10-01 US claimed
US-6171757-B1 USEFUL AS RESISTS AND WHICH ARE SENSITIVE TO IMAGING IRRADIATION WHILE EXHIBITING ENHANCED RESISTANCE TO REACTIVE ION ETCHING INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-01-09 US claimed
US-4031066-A Flexible polybutadiene resin composition having excellent electrical properties NIPPON SODA COMPANY LIMITED (JA) 1977-06-21 US claimed
JP-52019620-A None JP disclosed
JP-5039437-A None JP disclosed
EP-2495289-B1 PHOTOCURABLE COATING COMPOSITION AND COATING FILM FORMED BY HARDENING SAME KANEKA CORP (JP) 2019-05-01 EP disclosed
EP-2970115-B1 ALLOPHANATE POLYACRYLATE VENCOREX FRANCE (FR) 2018-06-27 EP disclosed
US-9932301-B2 Polyacrylate allophanate VENCOREX FRANCE (FR) 2018-04-03 US disclosed
US-20160024002-A1 POLYACRYLATE ALLOPHANATE VENCOREX FRANCE (FR) 2016-01-28 US disclosed
EP-2970115-A1 ALLOPHANATE POLYACRYLATE Vencorex France (FR) 2016-01-20 EP disclosed
US-4379862-A Process for the preparation of polyurethane resins using low molecular weight polyhydroxyl compounds prepared by the condensation of formaldehyde BAYER AKTIENGESELLSCHAFT (DE) 1983-04-12 US disclosed
US-4301310-A USING SYNTHESIS GAS DIRECTLY AS THE SOURCE OF FORMALDEHYDE BAYER AKTIENGESELLSCHAFT (DE) 1981-11-17 US disclosed
EP-0021959-A1 Polymerizable composition based on a water soluble ethylenic ester-alcohol and its application RHONE-POULENC INDUSTRIES (FR) 1981-01-07 EP disclosed
US-4219508-A FROM CONDENSATION OF UNPURIFIED FORMALDEHYDE BAYER AKTIENGESELLSCHAFT (DE) 1980-08-26 US disclosed
US-4144208-A ACRYLATE COPOLYMER, ACETOACETIC ACID ESTER CROSSLINKING AGENT DEUTSCHE TEXACO AKTIENGESELLSCHAFT (DE) 1979-03-13 US disclosed
JP-S5219620-A PROCESS FOR PREPARATION OF 2- HYDROXYALKYLACRYLATE TOAGOSEI CHEM IND CO LTD 1977-02-15 JP disclosed
US-3875211-A Process for preparing 2-hydroxyalkylacrylates and 2-hydroxyalkylmethacrylates ALCOLAC INC 1975-04-01 US disclosed